Hebei Key Laboratory of Crop Stress Biology, College of Agronomy and Biotechnology, Hebei Normal University of Science and Technology, Qinhuangdao, 066000, Hebei Province, China.
Tangshan Agriculture and Rural Affairs Bureau, Crop Seeds Station of Tangshan, Tangshan, 063000, Hebei Province, China.
Sci Rep. 2024 Sep 11;14(1):21213. doi: 10.1038/s41598-024-72203-7.
Although graphene oxide (GO) has extensive recognized application prospects in slow-release fertilizer, plant pest control, and plant growth regulation, the incorporation of GO into nano herbicides is still in its early stages of development. This study selected a pair of sweet corn sister lines, nicosulfuron (NIF)-resistant HK301 and NIF-sensitive HK320, and sprayed them both with 80 mg kg of GO-NIF, with clean water as a control, to study the effect of GO-NIF on sweet corn seedling growth, photosynthesis, chlorophyll fluorescence, and antioxidant system enzyme activity. Compared to spraying water and GO alone, spraying GO-NIF was able to effectively reduce the toxic effect of NIF on sweet corn seedlings. Compared with NIF treatment, 10 days after of spraying GO-NIF, the net photosynthetic rate (A), stomatal conductance (G), transpiration rate (E), photosystem II photochemical maximum quantum yield (F/F), photochemical quenching coefficient (q), and photosynthetic electron transfer rate (ETR) of GO-NIF treatment were significantly increased by 328.31%, 132.44%, 574.39%, 73.53%, 152.41%, and 140.72%, respectively, compared to HK320. Compared to the imbalance of redox reactions continuously induced by NIF in HK320, GO-NIF effectively alleviated the observed oxidative pressure. Furthermore, compared to NIF treatment alone, GO-NIF treatment effectively increased the activities of superoxide dismutase (SOD), guaiacol peroxidase (POD), catalase (CAT), and ascorbate peroxidase (APX) in both lines, indicating GO induced resistance to the damage caused by NIF to sweet corn seedlings. This study will provides an empirical basis for understanding the detoxification promoting effect of GO in NIF and analyzing the mechanism of GO induced allogeneic detoxification in cells.
虽然氧化石墨烯(GO)在缓释肥料、植物病虫害防治和植物生长调节等方面具有广泛的应用前景,但将 GO 纳入纳米除草剂的应用仍处于起步阶段。本研究选择了一对甜玉米姊妹系,对烟嘧磺隆(NIF)具有抗性的 HK301 和对 NIF 敏感的 HK320,分别用 80mg/kg 的 GO-NIF 喷雾处理,以清水为对照,研究 GO-NIF 对甜玉米幼苗生长、光合作用、叶绿素荧光和抗氧化系统酶活性的影响。与喷施清水和 GO 相比,喷施 GO-NIF 能有效降低 NIF 对甜玉米幼苗的毒害作用。与 NIF 处理相比,喷施 GO-NIF 10 天后,HK301 的净光合速率(A)、气孔导度(G)、蒸腾速率(E)、光系统 II 光化学最大量子产量(F/F)、光化学猝灭系数(q)和光合电子传递速率(ETR)分别显著增加了 328.31%、132.44%、574.39%、73.53%、152.41%和 140.72%,而 HK320 的相应数值分别增加了 244.67%、101.32%、549.64%、54.32%、117.13%和 95.32%。与 NIF 在 HK320 中不断诱导氧化还原反应失衡相比,GO-NIF 能有效缓解观察到的氧化压力。此外,与 NIF 单独处理相比,GO-NIF 处理能有效提高两条系中超氧化物歧化酶(SOD)、愈创木酚过氧化物酶(POD)、过氧化氢酶(CAT)和抗坏血酸过氧化物酶(APX)的活性,表明 GO 诱导了对 NIF 对甜玉米幼苗造成的损害的抗性。本研究将为了解 GO 在 NIF 中的解毒促进作用以及分析 GO 诱导细胞同种异体解毒的机制提供经验依据。