Liu Silin, Gu Yan, Lin Jieqiong, Xu Zisu, Gao Tianyu, Liu Xinyang, Zhang Xiaoming, Yu Bingjin
Jilin Provincial Key Laboratory of Micro-Nano and Ultra-Precision Manufacturing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave 2055, Changchun 130012, China.
Jilin Provincial Key Laboratory of International Science and Technology Cooperation for High Performance Manufacturing and Testing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave 2055, Changchun 130012, China.
Micromachines (Basel). 2024 Oct 9;15(10):1242. doi: 10.3390/mi15101242.
A rotary vibration-assisted polishing device (RVAPD) is designed to enhance polishing force by converting PZT's linear motion into the rotary motion of a central platform via a flexible mechanism, improving material surface quality. The RVAPD is optimized, simulated, and tested to meet high-frequency and large-amplitude non-resonant vibration polishing requirements. Its structure, designed using theoretical models and finite element software, offers a wide range of polishing parameters. Performance parameters are validated through open-loop tests, confirming effectiveness in polishing experiments. The lever mechanism and Hoeckens connection enhance vibration parameters and motion efficiency, reducing surface flaws in SiC and improving uniformity. Adjusting the RVAPD structure and using the proposed method significantly improve SiC surface quality.
旋转振动辅助抛光装置（RVAPD）旨在通过柔性机构将压电陶瓷（PZT）的直线运动转换为中心平台的旋转运动来增强抛光力，从而提高材料表面质量。对RVAPD进行了优化、模拟和测试，以满足高频和大振幅非共振振动抛光要求。其结构采用理论模型和有限元软件设计，提供了广泛的抛光参数。通过开环测试验证了性能参数，证实了其在抛光实验中的有效性。杠杆机构和赫肯斯连接增强了振动参数和运动效率，减少了碳化硅表面缺陷并提高了均匀性。调整RVAPD结构并使用所提出的方法可显著提高碳化硅表面质量。
