Shi Zhuofeng, Guo Wei, Bu Saiyu, Ma Lingmiao, Hu Zhaoning, Zhu Yaqi, Wu Haotian, Chen Xiaohui, Zhang Xiaodong, Novoselov Kostya S, Mao Boyang, Kang Ning, Lin Li
School of Materials Science and Engineering, Peking University, Beijing, People's Republic of China.
College of Chemistry and Chemical Engineering, Qingdao University, Qingdao, People's Republic of China.
Nat Mater. 2025 Mar 5. doi: 10.1038/s41563-025-02142-9.
The layered lanthanide oxychloride (LnOCl) family, featuring a low equivalent oxide thickness, high breakdown field and magnetic ordering properties, holds great promise for next-generation van der Waals devices. However, the exploitation of LnOCl materials has been hindered by a lack of reliable methods for growing their single-crystalline phases. Here we achieved the growth of inch-sized bulk LnOCl single crystals and single-crystalline thin films with thickness down to the monolayer in a few hours. The monolayer LnOCl exhibits ultralow equivalent oxide thicknesses, for instance, LaOCl and SmOCl have values of 0.25 and 0.34, respectively. Furthermore, using LnOCl as a dielectric in graphene devices, we demonstrate wafer-scale enhancement of carrier mobility and a well-developed quantum Hall effect. The induced strong magnetic proximity effect by SmOCl and DyOCl enables efficient interfacial charge transfer with magnetic exchange coupling This work provides a general strategy for synthesizing large-sized single-crystalline layered materials, enriching the library of ultralow-equivalent-oxide-thickness dielectric materials, and two-dimensional magnetic materials with induced strong magnetic proximity effect.
层状氯氧化镧(LnOCl)家族具有低等效氧化层厚度、高击穿场强和磁有序特性,在下一代范德华器件方面极具潜力。然而,由于缺乏可靠的生长其单晶相的方法,阻碍了对LnOCl材料的开发利用。在此,我们在数小时内实现了英寸级块状LnOCl单晶以及厚度低至单层的单晶薄膜的生长。单层LnOCl表现出超低的等效氧化层厚度,例如,LaOCl和SmOCl的值分别为0.25和0.34。此外,在石墨烯器件中使用LnOCl作为电介质,我们展示了晶圆级的载流子迁移率增强以及良好的量子霍尔效应。SmOCl和DyOCl诱导的强磁近邻效应实现了具有磁交换耦合的高效界面电荷转移。这项工作为合成大尺寸单晶层状材料提供了一种通用策略,丰富了超低等效氧化层厚度电介质材料以及具有诱导强磁近邻效应的二维磁性材料库。