Zhu Yaqi, Yu Beiming, Liu Xin, Zhang Jialin, Shi Zhuofeng, Hu Zhaoning, Bu Saiyu, Li Chunhu, Zhang Xiaodong, Lin Li
College of Chemistry and Chemical Engineering, Qingdao University, Qingdao 266000, P. R. China.
School of Materials Science and Engineering, Peking University, Beijing 100871, P. R. China.
Precis Chem. 2024 May 21;2(8):406-413. doi: 10.1021/prechem.4c00014. eCollection 2024 Aug 26.
The applications of two-dimensional semiconductors strictly require the reliable integration of ultrathin high-κ dielectric materials on the semiconductor surface to enable fine gate control and low power consumption. As layered oxide materials, MoO can be potentially used as a high-κ two-dimensional material with a larger bandgap and high electron affinity. In this work, relying on the oxidization of molybdenum chlorides, we have synthesized α-MoO single crystals, which can be easily exfoliated into flakes with thicknesses of a few nanometers and sizes of hundreds of micrometers and fine thermal stability. Based on measurement results of conventional metal/insulator/metal devices and graphene based dual-gate devices, the as-received MoO nanosheets exhibit improved dielectric performance, including high dielectric constants and competitive breakdown field strength. Our work demonstrates that MoO with improved crystalline quality is a promising candidate for dielectric materials with a large gate capacitance in future electronics based on two-dimensional materials.
二维半导体的应用严格要求在半导体表面可靠集成超薄高κ介电材料,以实现精细的栅极控制和低功耗。作为层状氧化物材料,MoO有潜力用作具有较大带隙和高电子亲和力的高κ二维材料。在这项工作中,我们依靠氯化钼的氧化反应,合成了α-MoO单晶,它可以很容易地剥离成厚度为几纳米、尺寸为数百微米的薄片,并且具有良好的热稳定性。基于传统金属/绝缘体/金属器件和石墨烯基双栅器件的测量结果,所得到的MoO纳米片表现出改善的介电性能,包括高介电常数和具有竞争力的击穿场强。我们的工作表明,具有改善晶体质量的MoO是未来基于二维材料的电子学中具有大栅极电容的介电材料的有前途的候选者。