Wang Xiaobing, Cao Chun, Shen Xiaoming, Ma Zhiyuan, Liao Wen, Tang Jin, Liu Qiulan, Wen Jisen, Jin Ming, Ni Jing, Kuang Cuifang, Liu Xu
Zhejiang Laboratory, Hangzhou 311121, China.
School of Mechanical Engineering, Hangzhou Dianzi University, Hangzhou 310018, China.
ACS Appl Mater Interfaces. 2025 Apr 23;17(16):24327-24338. doi: 10.1021/acsami.5c00344. Epub 2025 Apr 10.
Photoinhibited multiphoton lithography allows for high-precision nano additive manufacturing of arbitrary three-dimensional (3D) microstructures. However, its application is severely limited by the scarcity of effective initiators, as most conventional multiphoton lithography initiators lack photoinhibition capacity due to unavoidable single-photon absorption. Herein, we report a universal intermolecular energy transfer strategy that can deplete S state initiator molecules excited by single-photon absorption, thereby mitigating single-photon absorption-induced unwanted photopolymerization and shifting the role of the initiator from photopromotion to photoinhibition. As a result, the initiators for photoinhibited multiphoton lithography can be easily extended. Utilizing multispectral analysis and density functional theory calculations, we have elucidated the underlying mechanisms of photopromotion to photoinhibition by exploring intramolecular charge transfer and intermolecular energy transfer. This strategy has been validated with a range of commercial initiators, showcasing its versatility and effectiveness. Furthermore, the resolution of two-dimensional (2D) and 3D structures created through this strategy has been greatly improved while maintaining a high writing speed. These advancements have propelled the field of high-precision nano additive manufacturing, opening up new possibilities for the fabrication of intricate nanostructures.