使用石英晶体微天平对光刻胶中的光降解进行实时监测。
Real-time monitoring of photodegradation in photoresists using a quartz crystal microbalance.
作者信息
Gu Zhun, Yang Kaitong, Boamah Hayford, Chen Dong, Zhu Zhiqiang, Wang Jie
机构信息
School of Biomedical Sciences, Suzhou Chien-shiung Institute of Technology 1 Jianxiong Road Suzhou 215411 China
Institute for Advanced Materials, Jiangsu University Zhenjiang 212013 China
出版信息
RSC Adv. 2025 Apr 17;15(16):12304-12308. doi: 10.1039/d4ra05762g. eCollection 2025 Apr 16.
We report a quantitative method for the real-time evaluation of photoresist performance that integrates laser irradiation with quartz crystal microbalance (QCM) sensing technology. The results obtained for the model photoresist AZ1518 correlated with the traditionally obtained ones. Furthermore, the system revealed viscoelastic transitions and shear stress evolution during photoreactions.
我们报告了一种用于光刻胶性能实时评估的定量方法，该方法将激光辐照与石英晶体微天平（QCM）传感技术相结合。针对模型光刻胶AZ1518获得的结果与传统方法获得的结果相关。此外，该系统揭示了光反应过程中的粘弹性转变和剪切应力演变。
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