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用于低功耗柔性忆阻器的六方砷化硼纳米片的合成

Synthesis of hexagonal boron arsenide nanosheets for low-power consumption flexible memristors.

作者信息

Wu Zenghui, Zhang Yuxuan, Gao Boxiang, Meng You, Shao He, Li Dengji, Xie Pengshan, Wang Weijun, Li Bowen, Zhang Chenxu, Shen Yi, Yin Di, Chen Dong, Quan Quan, Yip SenPo, Ho Johnny C

机构信息

Department of Materials Science and Engineering, City University of Hong Kong, Hong Kong SAR, PR China.

Shenzhen Research Institute, City University of Hong Kong, Shenzhen, PR China.

出版信息

Nat Commun. 2025 May 22;16(1):4755. doi: 10.1038/s41467-025-60038-3.

Abstract

Boron arsenide has recently attracted significant attention for its thermal and electronic properties. However, its lengthy growth process and bulk structure limit its application in advanced semiconductor systems. In this study, we introduce a method for synthesizing ultrathin crystalline hexagonal boron arsenide (h-BAs) nanosheets in large quantities via an in-situ chemical reaction of sodium borohydride with elemental arsenic in a low-pressure hydrogen atmosphere. We successfully fabricated h-BAs-based memory devices with ON/OFF current ratios up to 10, low energy consumption of less than 4.65 pJ, and commendable stability. Furthermore, we have developed flexible h-BAs-based memristors with good stability and robustness. This research not only provides a promising avenue for synthesizing h-BAs nanosheets, but also underscores their potential in the development of next-generation electronic devices.

摘要

砷化硼因其热学和电学性质最近受到了广泛关注。然而,其漫长的生长过程和块状结构限制了它在先进半导体系统中的应用。在本研究中,我们介绍了一种通过硼氢化钠与元素砷在低压氢气气氛中进行原位化学反应大量合成超薄结晶六方砷化硼(h-BAs)纳米片的方法。我们成功制造出了基于h-BAs的存储器件,其开/关电流比高达10,能耗低于4.65 pJ,并且具有良好的稳定性。此外,我们还开发了具有良好稳定性和坚固性的基于h-BAs的柔性忆阻器。这项研究不仅为合成h-BAs纳米片提供了一条有前景的途径,还突出了它们在下一代电子器件开发中的潜力。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/28ee/12098672/49222d5eb601/41467_2025_60038_Fig1_HTML.jpg

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