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高熵合金薄膜作为自旋电子存储器的高效自旋轨道矩源

High Entropy Alloy Thin Films as Efficient Spin-Orbit Torque Sources for Spintronic Memories.

作者信息

Wang Peng, Migliorini Andrea, Li Yung-Cheng, Deniz Hakan, Kostanovski Ilya, Jeon Jae-Chun, Parkin Stuart S P

机构信息

Max Planck Institute of Microstructure Physics, 06120, Halle (Saale), Germany.

Institute of Physics, Martin Luther University Halle-Wittenberg, 06120, Halle (Saale), Germany.

出版信息

Adv Mater. 2025 Jul;37(30):e2416820. doi: 10.1002/adma.202416820. Epub 2025 Jun 4.

Abstract

High entropy alloys (HEAs) containing multiple elements are emerging as advanced materials with enhanced functionalities. However, their use for spintronic applications remains elusive. Here, it is demonstrated that iridium based HEAs, grown by magnetron sputtering at room temperature, can be used as spin Hall layers. These films display highly efficient conversion of charge current into spin current. They also allow for the epitaxial growth of magnetic multilayers with perpendicular magnetic anisotropy as well as synthetic antiferromagnets using a ternary RuAlGa antiferromagnetic coupling layer. It is demonstrated that iridium-based HEAs serve as effective sources of spin-orbit torque, as quantified by spin-torque ferromagnetic resonance and harmonic Hall measurements, enabling current-induced magnetization reversal and domain wall motion. The threshold current density for current-induced magnetization switching is found to be as low as ∼10 MA cm with reproducible deterministic switching, and that domain walls in HEA-based racetracks can be driven at speeds of up to 300 m s at a current density of 65 MA cm. These results show that HEAs should be considered for high-performance spintronic applications.

摘要

包含多种元素的高熵合金(HEAs)正作为具有增强功能的先进材料而兴起。然而,它们在自旋电子学应用中的使用仍然难以实现。在此,证明了通过室温磁控溅射生长的铱基高熵合金可作为自旋霍尔层。这些薄膜显示出电荷电流到自旋电流的高效转换。它们还允许具有垂直磁各向异性的磁性多层膜以及使用三元RuAlGa反铁磁耦合层的合成反铁磁体的外延生长。通过自旋扭矩铁磁共振和谐波霍尔测量量化表明,铱基高熵合金可作为自旋轨道扭矩的有效来源,实现电流诱导的磁化反转和畴壁运动。发现电流诱导磁化切换的阈值电流密度低至约10 MA/cm²,具有可重复的确定性切换,并且在65 MA/cm²的电流密度下,基于高熵合金的跑道中的畴壁可以以高达300 m/s的速度驱动。这些结果表明,高性能自旋电子学应用应考虑使用高熵合金。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3901/12306383/90af14ecca05/ADMA-37-2416820-g006.jpg

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