Wheeler Callum, Zhu Yuxiao, Sun Kai, Ding Bohao, Huang Ruomeng, Muskens Otto L, de Groot C H Kees
Electronics and Computer Science, Faculty of Engineering and Physical Sciences, University of Southampton, SO17 1BJ Southampton, UK.
Physics and Astronomy, Faculty of Engineering and Physical Sciences, University of Southampton, SO17 1BJ Southampton, UK.
iScience. 2025 Apr 24;28(6):112528. doi: 10.1016/j.isci.2025.112528. eCollection 2025 Jun 20.
Bolometers rely upon the temperature coefficient of resistance (TCR) of their underpinning sensing layer to detect infrared radiation. Vanadium dioxide (VO) exhibits a very large, but abrupt TCR associated with its monoclinic to rutile phase transition. W-doping of VO lowers and broadens its transition temperature, and by combining multiple discrete W:VO layers, a sensing layer can be created with an extended temperature operation region. Herein, we report such a multilayer W:VO thin film by atomic layer deposition (ALD). The film displays an average TCR of -9.5 (±3.5) %K from 30°C to 60°C. A sensing layer consisting of 10 individual W:VO layers is simulated with a multi-objective genetic algorithm (MOGA) for maximum average TCR (μ) and minimum variation (σ) across an extended target temperature range producing an optimized layer structure at max ( ) with average TCR response of -6.7 (±0.9) %K from 20°C to 70°C. This work highlights the potential for the broader application of uncooled bolometers.
测辐射热计依靠其基础传感层的电阻温度系数(TCR)来检测红外辐射。二氧化钒(VO)在从单斜相到金红石相转变时表现出非常大但很突然的TCR。对VO进行W掺杂会降低并拓宽其转变温度,通过组合多个离散的W:VO层,可以创建一个具有扩展温度工作范围的传感层。在此,我们报告了通过原子层沉积(ALD)制备的这种多层W:VO薄膜。该薄膜在30°C至60°C范围内显示出平均TCR为-9.5(±3.5)%K。使用多目标遗传算法(MOGA)对由10个单独的W:VO层组成的传感层进行模拟,以在扩展的目标温度范围内实现最大平均TCR(μ)和最小变化(σ),从而产生优化的层结构,在20°C至70°C范围内平均TCR响应为-6.7(±0.9)%K。这项工作突出了非制冷测辐射热计更广泛应用的潜力。