Chen Danyang, Dong Yulong, Cui Tianning, Xue Zhipeng, Yao Zikang, Gao Qiang, Wang Ruixue, Fan Yuyan, Liu Jingquan, Zhang Xin, Wang Zhen, Li Wenwu, Chu Junhao, Si Mengwei, Li Xiuyan
National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Shanghai Jiao Tong University, Shanghai, China.
School of Integrated Circuits (School of Information Science and Electronic Engineering), Shanghai Jiao Tong University, Shanghai, China.
Nat Commun. 2025 Sep 2;16(1):8188. doi: 10.1038/s41467-025-63298-1.
The polarization switching pathway in HfZrO-based ferroelectric thin film is still not well clarified and agreed, limiting the fundamental physical understanding and performance engineering. The key question lies in clarifying the transient intermediate state during the polarization switching of orthorhombic phase. In this work, by designing the ferroelectric and dielectric stacks, we theoretically and experimentally demonstrate a polarization switching pathway through an orthorhombic-tetragonal-orthorhombic phase transition in ferroelectric HfZrO where the non-polar tetragonal phase is metastable. Meanwhile, the phase transition pathway under electric field is experimentally demonstrated by in-situ grazing incidence X-ray diffraction measurement. Furthermore, by engineering the energy barrier of reversible orthorhombic-tetragonal phase transition through controlling the defects and interface properties, a low coercive field ~0.6 MV/cm and a low operation voltage <0.65 V is achieved in an 8 nm HfZrO film. Our results provide insights into the fundamental physics and performance engineering of ferroelectric HfZrO materials.
基于HfZrO的铁电薄膜中的极化切换路径仍未得到很好的阐明和认同,这限制了对其基本物理性质的理解和性能优化。关键问题在于弄清楚正交相极化切换过程中的瞬态中间状态。在这项工作中,通过设计铁电和介电堆栈,我们在理论和实验上证明了铁电HfZrO中通过正交-四方-正交相变的极化切换路径,其中非极性四方相是亚稳的。同时,通过原位掠入射X射线衍射测量实验证明了电场作用下的相变路径。此外,通过控制缺陷和界面性质来设计可逆正交-四方相变的能垒,在8nm的HfZrO薄膜中实现了~0.6 MV/cm的低矫顽场和<0.65V的低工作电压。我们的结果为铁电HfZrO材料的基本物理和性能工程提供了见解。