Chiang Yi-Cheng, Liu Po-Yen, Lin Erh-Chen, Fan Sheng-Hung, Hung Chih-Chieh, Cheng Yu-Hsiang, Lee Yi-Hsien
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, 30013, Taiwan.
Discov Nano. 2025 Sep 10;20(1):157. doi: 10.1186/s11671-025-04340-5.
Promoter-assisted chemical vapor deposition (CVD) has emerged as a robust strategy for the low-temperature synthesis of diverse transition metal dichalcogenides (TMDs). In these processes, promoter-induced intermediates facilitate specific reaction pathways, enabling controlled growth via vapor-solid-solid (VSS) or vapor-liquid-solid (VLS) modes. While previous studies have primarily focused on transition metal precursors, growth pathways involving engineered chalcogen-based intermediates remain underexplored due to their volatility and low melting points. Here, we demonstrate a stabilized chalcogen strategy that enables the scalable growth of highly crystalline tungsten-based (W-) TMDs through the formation of alkali-chalcogen mixtures within the VLS regime. Atomically resolved scanning tunneling microscopy (STM) of transferred WTe confirms ultraclean surfaces, attributed to the salt-like alkali-chalcogen interfacial layer that enables support-free film delamination. This work demonstrates a versatile route toward the scalable synthesis and clean manipulation of high-quality TMD.
促进剂辅助化学气相沉积(CVD)已成为一种用于低温合成多种过渡金属二硫属化物(TMD)的强大策略。在这些过程中,促进剂诱导的中间体促进特定的反应途径,通过气-固-固(VSS)或气-液-固(VLS)模式实现可控生长。虽然先前的研究主要集中在过渡金属前驱体上,但由于基于硫属元素的工程中间体具有挥发性和低熔点,涉及它们的生长途径仍未得到充分探索。在这里,我们展示了一种稳定的硫属元素策略,该策略通过在VLS体系中形成碱-硫属元素混合物,实现了高结晶度钨基(W-)TMD的可扩展生长。转移的WTe的原子分辨扫描隧道显微镜(STM)证实了超清洁表面,这归因于盐状碱-硫属元素界面层,该界面层使得薄膜能够无支撑分层。这项工作展示了一条通往高质量TMD可扩展合成和清洁操作的通用途径。