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使用摇摆角离子研磨技术改进用于层状结构横截面透射电子显微镜的样品制备。

Improved sample preparation for cross-sectional transmission electron microscopy of layered structures using rocking-angle ion-milling techniques.

作者信息

Lee J S, Jeong Y W, Kim S T

机构信息

LG Electronics Research Center, Seoul, South Korea.

出版信息

Microsc Res Tech. 1996 Apr 15;33(6):490-5. doi: 10.1002/(SICI)1097-0029(19960415)33:6<490::AID-JEMT3>3.0.CO;2-P.

Abstract

The rocking-angle ion-milling technique has been employed to produce optimum Pt/Ti/SiO2/Si, W/TiN/SiO2/Si, and (Pb,La)TiO3/Pt/MgO samples for cross-sectional transmission electron microscopy (TEM). Because of the different ion-milling rates between film layers and substrate materials, no satisfactory cross-sectional TEM samples could be obtained when they were made by the conventional ion-milling method. The differential thinning problems could be effectively solved by optimizing both ion-milling rocking-angle and ion-beam incidence angle without the increase of overall milling time. It was found that the rocking-angle of around 40 degrees is good when the multilayer structure is composed of materials with great ion-milling rate differences, while the rocking angle of around 80 degrees is good when the ion-milling rate differences are relatively small.

摘要

采用摇摆角离子研磨技术制备用于横截面透射电子显微镜(TEM)分析的最佳Pt/Ti/SiO2/Si、W/TiN/SiO2/Si和(Pb,La)TiO3/Pt/MgO样品。由于薄膜层与衬底材料之间的离子研磨速率不同,采用传统离子研磨方法制备时,无法获得令人满意的横截面TEM样品。通过优化离子研磨摇摆角和离子束入射角,在不增加整体研磨时间的情况下,可有效解决差异减薄问题。研究发现,当多层结构由离子研磨速率差异较大的材料组成时,约40度的摇摆角效果较好;而当离子研磨速率差异相对较小时,约80度的摇摆角效果较好。

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