Wall M A
Chemistry and Materials Science Department, Lawrence Livermore National Laboratory, Livermore, California 94551.
Microsc Res Tech. 1994 Feb 15;27(3):262-7. doi: 10.1002/jemt.1070270306.
A new preparation method permits the production of large-area, electron-transparent, transmission electron microscopy (TEM) specimens in cross section of free-standing, thick, multilayered structures. Such production often has been difficult in the past because of large chemical differences between the component layers in the multilayer. This difference usually results in a large difference in thinning rates between the layers. A unique combination of electroplating, lapping, dimpling, and low-angle ion milling is a successful and reproducible technique for producing high-quality TEM specimens of these complex materials. Procedures and results presented here are for a 304 stainless-steel/copper multilayer having a repeat period of 20 nm and a total thickness of 20 microns.
一种新的制备方法能够制作出大面积、电子透明的透射电子显微镜（TEM）标本，该标本取自独立的厚多层结构的横截面。过去，由于多层结构中各组成层之间存在很大的化学差异，这种制作往往很困难。这种差异通常会导致各层之间的减薄速率有很大差异。电镀、研磨、凹坑制作和低角度离子铣削的独特组合是一种成功且可重复的技术，可用于制作这些复杂材料的高质量TEM标本。这里展示的步骤和结果适用于一种重复周期为20纳米、总厚度为20微米的304不锈钢/铜多层结构。
