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硅掺杂到氮化镓纳米线中及所得复合材料的光学性质。

Doping of Si into GaN nanowires and optical properties of resulting composites.

作者信息

Xu Congkang, Chung Sangyong, Kim Misuk, Kim Dong Eon, Chon Bonghwan, Hong Sangsu, Joo Taiha

机构信息

Department of Physics and Electron Spin Science Center, Pohang University of Science and Technology, Pohang 790-784, South Korea.

出版信息

J Nanosci Nanotechnol. 2005 Apr;5(4):530-5. doi: 10.1166/jnn.2005.097.

Abstract

Doping of Si into GaN nanowires has been successfully attained via thermal evaporation in the presence of a suitable gas atmosphere. Analysis indicated that the Si-doped GaN nanowire is a single crystal with a hexagonal wurtzite structure, containing 2.2 atom % of Si. The broadening and the shift of Raman peak to lower frequency are observed, which may be attributed to surface disorder and various strengths of the stress. The band-gap emission (358 nm) of Si-doped GaN nanowires relative to that (370 nm) of GaN nanowires has an apparent blue shift (approximately 12 nm), which can be ascribed to doping impurity Si.

摘要

通过在合适的气体气氛中进行热蒸发,已成功实现了硅对氮化镓纳米线的掺杂。分析表明,硅掺杂的氮化镓纳米线是具有六方纤锌矿结构的单晶,含有2.2原子百分比的硅。观察到拉曼峰变宽并向低频移动,这可能归因于表面无序和各种应力强度。相对于氮化镓纳米线的带隙发射(370纳米),硅掺杂的氮化镓纳米线的带隙发射(358纳米)有明显的蓝移(约12纳米),这可归因于掺杂杂质硅。

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