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掺杂过渡金属和复合氧化物薄膜的外延生长和性能。

Epitaxial growth and properties of doped transition metal and complex oxide films.

机构信息

Chemical and Materials Science Division, Fundamental and Computational Sciences Directorate, Pacific Northwest National Laboratory, PO Box 999, MS K8-87, Richland, WA 99352, USA.

出版信息

Adv Mater. 2010 Jan 12;22(2):219-48. doi: 10.1002/adma.200901867.

Abstract

The detailed science and technology of crystalline oxide film growth using vacuum methods is reviewed and discussed with an eye toward gaining fundamental insights into the relationships between growth process and parameters, film and interface structure and composition, and electronic, magnetic and photochemical properties. The topic is approached first from a comparative point of view based on the most widely used growth methods, and then on the basis of specific material systems that have generated very high levels of interest. Emphasis is placed on the wide diversity of structural, electronic, optical and magnetic properties exhibited by oxides, and the fascinating results that this diversity of properties can produce when combined with the degrees of freedom afforded by heteroepitaxy.

摘要

本文综述并讨论了使用真空方法生长晶态氧化物薄膜的详细科学和技术,以期深入了解生长过程和参数、薄膜和界面结构和组成以及电子、磁性和光化学性质之间的关系。首先从最广泛使用的生长方法的比较观点出发,然后从产生了非常高兴趣的特定材料体系的基础上,来探讨这个主题。重点是氧化物所表现出的广泛的结构、电子、光学和磁性性质,以及当与异质外延所提供的自由度相结合时,这种性质多样性可以产生的迷人结果。

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