Xue Gaopeng, Zhai Qihang, Lu Haiou, Zhou Qian, Ni Kai, Lin Liyu, Wang Xiaohao, Li Xinghui
Tsinghua Shenzhen International Graduate School, Tsinghua University, Tsinghua Campus, the University Town, Shenzhen, 518055 China.
Tsinghua-Berkeley Shenzhen Institute, Tsinghua University, Tsinghua Campus, the University Town, Shenzhen, 518055 China.
Microsyst Nanoeng. 2021 Apr 15;7:31. doi: 10.1038/s41378-021-00256-z. eCollection 2021.
Periodic microscale array structures play an important role in diverse applications involving photonic crystals and diffraction gratings. A polarized holographic lithography system is proposed for patterning high-uniformity microscale two-dimensional crossed-grating structures with periodic tunability. Orthogonal two-axis Lloyd's mirror interference and polarization modulation produce three sub-beams, enabling the formation of two-dimensional crossed-grating patterns with wavelength-comparable periods by a single exposure. The two-dimensional-pattern period can also be flexibly tuned by adjusting the interferometer spatial positioning. Polarization states of three sub-beams, defining the uniformity of the interference fringes, are modulated at their initial-polarization states based on a strict full polarization tracing model in a three-dimensional space. A polarization modulation model is established considering two conditions of eliminating the unexpected interference and providing the desired identical interference intensities. The proposed system is a promising approach for fabricating high-uniformity two-dimensional crossed gratings with a relatively large grating period range of 500-1500 nm. Moreover, our rapid and stable approach for patterning period-tunable two-dimensional-array microstructures with high uniformity could be applicable to other multibeam interference lithography techniques.
周期性微尺度阵列结构在涉及光子晶体和衍射光栅的各种应用中发挥着重要作用。本文提出了一种偏振全息光刻系统，用于制备具有周期性可调性的高均匀性微尺度二维交叉光栅结构。正交双轴洛埃镜干涉和偏振调制产生三束子光束，通过单次曝光即可形成周期与波长可比的二维交叉光栅图案。二维图案周期也可通过调整干涉仪的空间定位进行灵活调节。基于三维空间中的严格全偏振追踪模型，在三束子光束的初始偏振态下对定义干涉条纹均匀性的偏振态进行调制。考虑消除意外干涉和提供所需相同干涉强度这两种情况，建立了偏振调制模型。所提出的系统是一种很有前景的方法，可用于制造具有500 - 1500 nm相对较大光栅周期范围的高均匀性二维交叉光栅。此外，我们用于快速稳定地制备具有高均匀性的周期可调二维阵列微结构的方法可应用于其他多光束干涉光刻技术。
