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无掩模刻蚀技术制备的超薄硅纳米线中的量子限制和电致发光。

Quantum confinement and electroluminescence in ultrathin silicon nanowires fabricated by a maskless etching technique.

机构信息

MATIS IMM-CNR, Via S Sofia, 64, 95123 Catania, Italy.

出版信息

Nanotechnology. 2012 Feb 24;23(7):075204. doi: 10.1088/0957-4484/23/7/075204. Epub 2012 Jan 24.

Abstract

We present a novel approach for the direct synthesis of ultrathin Si nanowires (NWs) exhibiting room temperature light emission. The synthesis is based on a wet etching process assisted by a metal thin film. The thickness-dependent morphology of the metal layer produces uncovered nanometer-size regions which act as precursor sites for NW formation. The process is cheap, fast, maskless and compatible with Si technology. Very dense arrays of long (several micrometers) and small (diameter of 5-9 nm) NWs have been synthesized. An efficient room temperature luminescence, visible with the naked eye, is observed when NWs are optically excited, exhibiting a blue-shift with decreasing NW size in agreement with quantum confinement effects. A prototype device based on Si NWs has been fabricated showing a strong and stable electroluminescence at low voltages. The relevance and the perspectives of the reported results are discussed, opening the route toward novel applications of Si NWs.

摘要

我们提出了一种新颖的方法,用于直接合成具有室温发光的超薄硅纳米线(NWs)。该合成基于湿法刻蚀工艺,辅之以金属薄膜。金属层的厚度依赖性形态产生了未覆盖的纳米级区域,这些区域充当 NW 形成的前体位点。该工艺成本低、速度快、无需掩模,与硅技术兼容。已经合成了非常密集的长(数微米)和小(直径 5-9nm)NWs 阵列。当 NWs 被光激发时,观察到有效的室温发光,肉眼可见,并表现出与量子限制效应一致的蓝移,随着 NW 尺寸的减小而减小。已经制造了基于 Si NWs 的原型器件,该器件在低电压下表现出强而稳定的电致发光。讨论了所报道结果的相关性和前景,为 Si NWs 的新应用开辟了道路。

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