Lim Hyung Jun, Lee Jae Jong, Park Sunggook, Choi Kee-Bong, Kim Gee Hong, Park Hyun Ha, Ryu Ji Hyeong
Korea Institute of Machinery and Materials, 156 Gajeongbuk-Ro, Yuseong-Gu, Daejeon 305-343, South Korea.
J Nanosci Nanotechnol. 2012 Jul;12(7):5489-93. doi: 10.1166/jnn.2012.6260.
This paper presents the fabrication of a thin and flexible polydimethylsiloxane (PDMS) stamp with a thickness of a few tens of um and its application to nanoimprint lithography (NIL). The PDMS material generally has a low elastic modulus and high adhesive characteristics. Therefore, after being treated, the thin PDMS stamp is easily deformed and torn, adhering to itself and other materials. This paper introduces the use of a metal ring around the flange of a thin PDMS stamp to assist with the handling of this material. A PDMS stamp with a motheye pattern in nanometer scale was inserted between a substrate and a microstamp with concave patterns in micrometer scale. Subsequently, three-dimensional (3D) hybrid nano/micropatterns were fabricated by pressing these two stamps and curing the resist. The fabricated hybrid patterns were measured and verified in both the microscale and nanoscale. The process, termed "dual NIL," can be applied to the fabrication of optical components or bio-sensors that require repetitive nanopatterns on micropatterns.
本文介绍了一种厚度为几十微米的薄且柔性的聚二甲基硅氧烷（PDMS）印章的制备及其在纳米压印光刻（NIL）中的应用。PDMS材料通常具有低弹性模量和高粘附特性。因此，经过处理后，薄PDMS印章很容易变形和撕裂，会与自身及其他材料粘附。本文介绍了在薄PDMS印章的凸缘周围使用金属环来辅助处理这种材料。将具有纳米级蛾眼图案的PDMS印章插入到具有微米级凹图案的基板和微印章之间。随后，通过按压这两个印章并固化抗蚀剂来制造三维（3D）混合纳米/微图案。对制造的混合图案在微观和纳米尺度上进行了测量和验证。该工艺被称为“双重NIL”，可应用于制造在微图案上需要重复纳米图案的光学元件或生物传感器。
