Tunable synthesis and in situ growth of silicon-carbon mesostructures using impermeable plasma.

In recent years, plasma-assisted synthesis has been extensively used in large scale production of functional nano- and micro-scale materials for numerous applications in optoelectronics, photonics, plasmonics, magnetism and drug delivery, however systematic formation of these minuscule structures has remained a challenge. Here we demonstrate a new method to closely manipulate mesostructures in terms of size, composition and morphology by controlling permeability at the boundaries of an impermeable plasma surrounded by a blanket of neutrals. In situ and rapid growth of thin films in the core region due to ion screening is among other benefits of our method. Similarly we can take advantage of exceptional properties of plasma to control the morphology of the as deposited nanostructures. Probing the plasma at boundaries by means of observing the nanostructures, further provides interesting insights into the behaviour of gas-insulated plasmas with possible implications on efficacy of viscous heating and non-magnetic confinement.