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通过铁磁接触控制单层 MoS2 晶体管中的肖特基势垒。

Control of Schottky barriers in single layer MoS2 transistors with ferromagnetic contacts.

机构信息

Department of Physics and Astronomy, University of California , Riverside, California, United States.

出版信息

Nano Lett. 2013 Jul 10;13(7):3106-10. doi: 10.1021/nl4010157. Epub 2013 Jun 12.

Abstract

MoS2 and related metal dichalcogenides (MoSe2, WS2, WSe2) are layered two-dimensional materials that are promising for nanoelectronics and spintronics. For instance, large spin-orbit coupling and spin splitting in the valence band of single layer (SL) MoS2 could lead to enhanced spin lifetimes and large spin Hall angles. Understanding the nature of the contacts is a critical first step for realizing spin injection and spin transport in MoS2. Here, we have investigated Co contacts to SL MoS2 and find that the Schottky barrier height can be significantly decreased with the addition of a thin oxide barrier (MgO). Further, we show that the barrier height can be reduced to zero by tuning the carrier density with back gate. Therefore, the MgO could simultaneously provide a tunnel barrier to alleviate conductance mismatch while minimizing carrier depletion near the contacts. Such control over the barrier height should allow for careful engineering of the contacts to realize spin injection in these materials.

摘要

二硫化钼和相关的金属二卤代物(MoSe2、WS2、WSe2)是具有层状结构的二维材料,它们在纳米电子学和自旋电子学方面具有广阔的应用前景。例如,单层(SL)MoS2 价带中的大自旋轨道耦合和自旋劈裂可以导致自旋寿命的延长和大的自旋霍尔角。理解接触的性质是实现 MoS2 中自旋注入和自旋输运的关键第一步。在这里,我们研究了 Co 与 SL MoS2 的接触,发现通过添加薄的氧化物势垒(MgO)可以显著降低肖特基势垒高度。此外,我们还表明,通过背栅调节载流子密度,可以将势垒高度降低到零。因此,MgO 可以同时提供一个隧道势垒来缓解电导失配,同时最大限度地减少接触附近的载流子耗尽。这种对势垒高度的控制应该可以实现对这些材料中自旋注入的精细工程控制。

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