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一种用于在任意衬底上大规模制造有机单晶器件的高产率两步转移印刷方法。

A high-yield two-step transfer printing method for large-scale fabrication of organic single-crystal devices on arbitrary substrates.

作者信息

Deng Wei, Zhang Xiujuan, Pan Huanhuan, Shang Qixun, Wang Jincheng, Zhang Xiaohong, Zhang Xiwei, Jie Jiansheng

机构信息

Institute of Functional Nano & Soft Materials (FUNSOM) & Collaborative Innovation Center of Suzhou Nano Science and Technology, Jiangsu Key Laboratory for Carbon-Based Functional Materials & Devices, Soochow University, Suzhou Jiangsu, 215123, P. R. China.

出版信息

Sci Rep. 2014 Jun 19;4:5358. doi: 10.1038/srep05358.

Abstract

Single-crystal organic nanostructures show promising applications in flexible and stretchable electronics, while their applications are impeded by the large incompatibility with the well-developed photolithography techniques. Here we report a novel two-step transfer printing (TTP) method for the construction of organic nanowires (NWs) based devices onto arbitrary substrates. Copper phthalocyanine (CuPc) NWs are first transfer-printed from the growth substrate to the desired receiver substrate by contact-printing (CP) method, and then electrode arrays are transfer-printed onto the resulting receiver substrate by etching-assisted transfer printing (ETP) method. By utilizing a thin copper (Cu) layer as sacrificial layer, microelectrodes fabricated on it via photolithography could be readily transferred to diverse conventional or non-conventional substrates that are not easily accessible before with a high transfer yield of near 100%. The ETP method also exhibits an extremely high flexibility; various electrodes such as Au, Ti, and Al etc. can be transferred, and almost all types of organic devices, such as resistors, Schottky diodes, and field-effect transistors (FETs), can be constructed on planar or complex curvilinear substrates. Significantly, these devices can function properly and exhibit closed or even superior performance than the device counterparts fabricated by conventional approach.

摘要

单晶有机纳米结构在柔性和可拉伸电子学中显示出广阔的应用前景,但其应用受到与成熟光刻技术的巨大不兼容性的阻碍。在此,我们报道了一种新颖的两步转移印刷(TTP)方法,用于在任意衬底上构建基于有机纳米线(NWs)的器件。首先通过接触印刷(CP)方法将铜酞菁(CuPc)纳米线从生长衬底转移印刷到所需的接收衬底上,然后通过蚀刻辅助转移印刷(ETP)方法将电极阵列转移印刷到所得的接收衬底上。通过使用薄铜(Cu)层作为牺牲层,通过光刻在其上制造的微电极可以很容易地转移到各种传统或非传统衬底上,这些衬底以前不容易获得,转移产率接近100%。ETP方法还具有极高的灵活性;诸如Au、Ti和Al等各种电极都可以转移,并且几乎所有类型的有机器件,如电阻器、肖特基二极管和场效应晶体管(FET),都可以在平面或复杂的曲线衬底上构建。值得注意的是,这些器件能够正常工作,并且表现出与通过传统方法制造的器件相当甚至更优的性能。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5304/4062903/8a5409909a09/srep05358-f1.jpg

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