Zhong Jian, Sun Gang, He Dannong
National Engineering Research Center for Nanotechnology, Shanghai 200241, People's Republic of China.
Nanoscale. 2014 Nov 7;6(21):12217-28. doi: 10.1039/c4nr04296d.
As a powerful atomic force microscopy-based nanotechnological tool, dip-pen nanolithography (DPN) has provided an ideal direct-write "constructive" lithographic tool that allows materials to be patterned from DPN tips onto a surface with high registration and sub-15 nm resolution. In the past few decades, DPN has been enormously developed for studying the patterning of inorganic, organic, and biological materials onto a variety of substrates. The focus of this review is on the development of three types of DPN: classic, liquid, and matrix-assisted DPN. Such development mainly includes the following aspects: the comparisons of three types of DPN, the effect factors and basic mechanisms of three types of DPN, and the application progress of three types of DPN.
作为一种基于强大原子力显微镜的纳米技术工具，蘸笔纳米光刻技术（DPN）提供了一种理想的直接写入“建设性”光刻工具，该工具能够将材料从DPN针尖以高对准精度和低于15纳米的分辨率图案化到表面上。在过去几十年中，DPN在研究将无机、有机和生物材料图案化到各种基底上方面得到了极大发展。本综述的重点是三种类型的DPN的发展：经典DPN、液体DPN和基质辅助DPN。这种发展主要包括以下几个方面：三种类型DPN的比较、三种类型DPN的影响因素和基本机制，以及三种类型DPN的应用进展。
