Laboratory for Advanced Interfacial Materials and Devices, Institute of Textiles and Clothing, The Hong Kong Polytechnic University, Hung Hom, Kowloon, 999077, Hong Kong SAR, China.
Institute of Nanotechnology (INT) and Karlsruhe, Nano Micro Facility (KNMF), Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, 76344, Eggenstein-Leopoldshafen, Germany.
Small. 2019 May;15(21):e1900564. doi: 10.1002/smll.201900564. Epub 2019 Apr 12.
Dip-pen nanolithography (DPN) is a unique nanofabrication tool that can directly write a variety of molecular patterns on a surface with high resolution and excellent registration. Over the past 20 years, DPN has experienced a tremendous evolution in terms of applicable inks, a remarkable improvement in fabrication throughput, and the development of various derivative technologies. Among these developments, polymer pen lithography (PPL) is the most prominent one that provides a large-scale, high-throughput, low-cost tool for nanofabrication, which significantly extends DPN and beyond. These developments not only expand the scope of the wide field of scanning probe lithography, but also enable DPN and PPL as general approaches for the fabrication or study of nanostructures and nanomaterials. In this review, a focused summary and historical perspective of the technological development of DPN and its derivatives, with a focus on PPL, in one timeline, are provided and future opportunities for technological exploration in this field are proposed.
蘸笔纳米光刻（DPN）是一种独特的纳米制造工具，可以在表面上以高分辨率和优异的配准直接写入各种分子图案。在过去的 20 年中，DPN 在适用墨水方面经历了巨大的发展，制造吞吐量有了显著提高，并且开发了各种衍生技术。在这些发展中，聚合物笔光刻（PPL）最为突出，它为纳米制造提供了一种大规模、高通量、低成本的工具，极大地扩展了 DPN 的应用范围。这些发展不仅扩展了扫描探针光刻的广泛领域，而且使 DPN 和 PPL 成为制造或研究纳米结构和纳米材料的通用方法。在这篇综述中，沿着一个时间线，对 DPN 及其衍生物的技术发展进行了重点总结和历史回顾，重点介绍了 PPL，并提出了该领域技术探索的未来机会。
