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纤维素的光刻图案化:一种用于先进应用的多功能双色调光刻胶。

Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications.

作者信息

Wolfberger Archim, Petritz Andreas, Fian Alexander, Herka Jakob, Schmidt Volker, Stadlober Barbara, Kargl Rupert, Spirk Stefan, Griesser Thomas

机构信息

Chair of Chemistry of Polymeric Materials, University of Leoben, Otto Glöckel-Straße 2, 8700 Leoben, Austria.

Materials-Institute for Surface Technologies and Photonics, Joanneum Research Forschungsgesellschaft mbH, Franz-Pichler-Straße 30, 8160 Weiz, Austria.

出版信息

Cellulose (Lond). 2015;22(1):717-727. doi: 10.1007/s10570-014-0471-4. Epub 2014 Oct 16.

DOI:10.1007/s10570-014-0471-4
PMID:26412951
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC4579862/
Abstract

In many areas of science and technology, patterned films and surfaces play a key role in engineering and development of advanced materials. Here, we present a versatile toolbox that provides an easy patterning method for cellulose thin films by means of photolithography and enzymatic digestion. A patterned UV-illumination of trimethylsilyl cellulose thin films containing small amounts of a photo acid generator leads to a desilylation reaction and thus to the formation of cellulose in the irradiated areas. Depending on the conditions of development, either negative and positive type cellulose structures can be obtained, offering lateral resolutions down to the single-digit micro meter range by means of contact photolithography. In order to highlight the potential of this material for advanced patterning techniques, cellulose structures with sub-µm resolution are fabricated by means of two-photon absorption lithography. Moreover, these photochemically structured cellulose thin films are successfully implemented as dielectric layers in prototype organic thin film transistors. Such photopatternable dielectric layers are crucial for the realization of electrical interconnects for demanding organic device architectures.

摘要

在许多科学技术领域,图案化薄膜和表面在先进材料的工程与开发中发挥着关键作用。在此,我们展示了一个多功能工具箱,它通过光刻和酶解作用为纤维素薄膜提供了一种简便的图案化方法。对含有少量光酸产生剂的三甲基硅烷基纤维素薄膜进行图案化紫外线照射会引发去硅烷化反应,进而在照射区域形成纤维素。根据显影条件,可以获得负型和正型纤维素结构,通过接触光刻法可实现低至个位数微米范围的横向分辨率。为了突出这种材料在先进图案化技术方面的潜力,利用双光子吸收光刻法制造了具有亚微米分辨率的纤维素结构。此外,这些光化学结构化纤维素薄膜成功地用作原型有机薄膜晶体管的介电层。这种可光图案化的介电层对于实现用于复杂有机器件架构的电互连至关重要。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/de33/4579862/e72bf8e11d9b/10570_2014_471_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/de33/4579862/e72bf8e11d9b/10570_2014_471_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/de33/4579862/e72bf8e11d9b/10570_2014_471_Fig1_HTML.jpg

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