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二硫化钼、二硒化钼、二硫化钨和二硒化钨晶体中直接光学跃迁以及半导体到金属跃迁的压力系数。

Pressure coefficients for direct optical transitions in MoS2, MoSe2, WS2, and WSe2 crystals and semiconductor to metal transitions.

作者信息

Dybała F, Polak M P, Kopaczek J, Scharoch P, Wu K, Tongay S, Kudrawiec R

机构信息

Faculty of Fundamental Problems of Technology, Wroclaw University of Technology, Wybrzeże Wyspiańskiego 27, 50-370 Wrocław, Poland.

School for Engineering of Matter, Transport and Energy, Arizona State University, Tempe, Arizona 85287, United States.

出版信息

Sci Rep. 2016 May 24;6:26663. doi: 10.1038/srep26663.

Abstract

The electronic band structure of MoS2, MoSe2, WS2, and WSe2, crystals has been studied at various hydrostatic pressures experimentally by photoreflectance (PR) spectroscopy and theoretically within the density functional theory (DFT). In the PR spectra direct optical transitions (A and B) have been clearly observed and pressure coefficients have been determined for these transitions to be: αA = 2.0 ± 0.1 and αB = 3.6 ± 0.1 meV/kbar for MoS2, αA = 2.3 ± 0.1 and αB = 4.0 ± 0.1 meV/kbar for MoSe2, αA = 2.6 ± 0.1 and αB = 4.1 ± 0.1 meV/kbar for WS2, αA = 3.4 ± 0.1 and αB = 5.0 ± 0.5 meV/kbar for WSe2. It has been found that these coefficients are in an excellent agreement with theoretical predictions. In addition, a comparative study of different computational DFT approaches has been performed and analyzed. For indirect gap the pressure coefficient have been determined theoretically to be -7.9, -5.51, -6.11, and -3.79, meV/kbar for MoS2, MoSe2, WS2, and WSe2, respectively. The negative values of this coefficients imply a narrowing of the fundamental band gap with the increase in hydrostatic pressure and a semiconductor to metal transition for MoS2, MoSe2, WS2, and WSe2, crystals at around 140, 180, 190, and 240 kbar, respectively.

摘要

通过光反射光谱法在不同静水压力下对二硫化钼(MoS₂)、二硒化钼(MoSe₂)、二硫化钨(WS₂)和二硒化钨(WSe₂)晶体的电子能带结构进行了实验研究,并在密度泛函理论(DFT)框架内进行了理论研究。在光反射光谱中清晰地观察到了直接光学跃迁(A和B),并确定了这些跃迁的压力系数分别为:MoS₂的αA = 2.0±0.1和αB = 3.6±0.1 meV/kbar;MoSe₂的αA = 2.3±0.1和αB = 4.0±0.1 meV/kbar;WS₂的αA = 2.6±0.1和αB = 4.1±0.1 meV/kbar;WSe₂的αA = 3.4±0.1和αB = 5.0±0.5 meV/kbar。发现这些系数与理论预测结果非常吻合。此外,还对不同的计算DFT方法进行了比较研究和分析。对于间接带隙,理论上确定MoS₂、MoSe₂、WS₂和WSe₂的压力系数分别为-7.9、-5.51、-6.11和-3.79 meV/kbar。这些系数的负值意味着随着静水压力的增加,基本带隙变窄,并且MoS₂、MoSe₂、WS₂和WSe₂晶体分别在约140、180、190和240 kbar时会发生从半导体到金属的转变。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/dd7f/4877596/b1d088deb835/srep26663-f1.jpg

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