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Nanomembrane-based materials for Group IV semiconductor quantum electronics.用于IV族半导体量子电子学的基于纳米膜的材料。
Sci Rep. 2014 Feb 27;4:4218. doi: 10.1038/srep04218.
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Semiconductor nanomembranes: a platform for new properties via strain engineering.半导体纳米膜:通过应变工程获得新性质的平台。
Nanoscale Res Lett. 2012 Nov 15;7(1):628. doi: 10.1186/1556-276X-7-628.
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Nanoscale InGaSb heterostructure membranes on Si substrates for high hole mobility transistors.硅衬底上的纳观 InGaSb 异质结构膜用于高性能空穴迁移率晶体管
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Electronic band structures and optical properties of type-II superlattice photodetectors with interfacial effect.具有界面效应的II型超晶格光电探测器的电子能带结构和光学性质
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Defect-free single-crystal SiGe: a new material from nanomembrane strain engineering.无缺陷单晶 SiGe:一种源自纳米薄膜应变工程的新材料。
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High-performance single-crystalline arsenic-doped indium oxide nanowires for transparent thin-film transistors and active matrix organic light-emitting diode displays.高性能砷掺杂氧化铟单晶纳米线用于透明薄膜晶体管和有源矩阵有机发光二极管显示器。
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基于锑化物的膜合成、集成与应变工程。

Antimonide-based membranes synthesis integration and strain engineering.

作者信息

Zamiri Marziyeh, Anwar Farhana, Klein Brianna A, Rasoulof Amin, Dawson Noel M, Schuler-Sandy Ted, Deneke Christoph F, Ferreira Sukarno O, Cavallo Francesca, Krishna Sanjay

机构信息

Department of Electrical and Computer Engineering, University of New Mexico, Albuquerque, NM 87106;

Center for High Technology Materials, University of New Mexico, Albuquerque, NM 87106.

出版信息

Proc Natl Acad Sci U S A. 2017 Jan 3;114(1):E1-E8. doi: 10.1073/iti0117114. Epub 2016 Dec 16.

DOI:10.1073/iti0117114
PMID:27986953
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC5224370/
Abstract

Antimonide compounds are fabricated in membrane form to enable materials combinations that cannot be obtained by direct growth and to support strain fields that are not possible in the bulk. InAs/(InAs,Ga)Sb type II superlattices (T2SLs) with different in-plane geometries are transferred from a GaSb substrate to a variety of hosts, including Si, polydimethylsiloxane, and metal-coated substrates. Electron microscopy shows structural integrity of transferred membranes with thickness of 100 nm to 2.5 [Formula: see text]m and lateral sizes from [Formula: see text]m to [Formula: see text] cm Electron microscopy reveals the excellent quality of the membrane interface with the new host. The crystalline structure of the T2SL is not altered by the fabrication process, and a minimal elastic relaxation occurs during the release step, as demonstrated by X-ray diffraction and mechanical modeling. A method to locally strain-engineer antimonide-based membranes is theoretically illustrated. Continuum elasticity theory shows that up to [Formula: see text]3.5% compressive strain can be induced in an InSb quantum well through external bending. Photoluminescence spectroscopy and characterization of an IR photodetector based on InAs/GaSb bonded to Si demonstrate the functionality of transferred membranes in the IR range.

摘要

锑化物化合物被制成膜状,以实现通过直接生长无法获得的材料组合,并支持在体材料中不可能存在的应变场。具有不同面内几何形状的InAs/(InAs,Ga)Sb II型超晶格(T2SL)从GaSb衬底转移到包括Si、聚二甲基硅氧烷和金属涂层衬底在内的各种主体上。电子显微镜显示转移膜的结构完整性,其厚度为100纳米至2.5微米,横向尺寸从微米至厘米。电子显微镜揭示了膜与新主体之间界面的优异质量。T2SL的晶体结构在制造过程中未发生改变,并且在释放步骤中发生的弹性弛豫极小,这通过X射线衍射和力学建模得到了证明。从理论上说明了一种对基于锑化物的膜进行局部应变工程的方法。连续介质弹性理论表明,通过外部弯曲,InSb量子阱中可诱导高达3.5%的压缩应变。基于键合到Si上的InAs/GaSb的红外光电探测器的光致发光光谱和表征证明了转移膜在红外范围内的功能。