L-NESS, Department of Physics, Politecnico di Milano, Polo di Como, Via Anzani 42, 22100, Como, Italy.
Department of Microtechnology and Nanoscience, Chalmers University of Technology, Gothenburg, 41296, Sweden.
Sci Rep. 2017 May 25;7(1):2419. doi: 10.1038/s41598-017-02541-2.
The high-frequency performance of transistors is usually assessed by speed and gain figures of merit, such as the maximum oscillation frequency f , cutoff frequency f , ratio f /f , forward transmission coefficient S , and open-circuit voltage gain A . All these figures of merit must be as large as possible for transistors to be useful in practical electronics applications. Here we demonstrate high-performance graphene field-effect transistors (GFETs) with a thin AlOx gate dielectric which outperform previous state-of-the-art GFETs: we obtained f /f > 3, A > 30 dB, and S = 12.5 dB (at 10 MHz and depending on the transistor geometry) from S-parameter measurements. A dc characterization of GFETs in ambient conditions reveals good current saturation and relatively large transconductance ~600 S/m. The realized GFETs offer the prospect of using graphene in a much wider range of electronic applications which require substantial gain.
晶体管的高频性能通常通过速度和增益等性能指标来评估,如最高振荡频率 f 、截止频率 f 、 f / f 比、正向传输系数 S 和开路电压增益 A 。对于晶体管在实际电子应用中有用,所有这些性能指标都必须尽可能大。在这里,我们展示了具有薄 AlOx 栅介质的高性能石墨烯场效应晶体管(GFET),其性能超过了以前的最先进的 GFET:我们从 S 参数测量中获得了 f / f > 3、A > 30 dB 和 S = 12.5 dB(在 10 MHz 且取决于晶体管几何形状)。在环境条件下对 GFET 的直流特性进行表征,发现电流饱和良好,相对较大的跨导约为 600 S/m。所实现的 GFET 有望在需要大量增益的更广泛的电子应用中使用石墨烯。