Advanced Microelectronic Center Aachen (AMICA), AMO GmbH, Otto-Blumenthal-Strasse 25, 52074 Aachen, Germany.
Nano Lett. 2012 Mar 14;12(3):1324-8. doi: 10.1021/nl2038634. Epub 2012 Feb 22.
The emergence of graphene with its unique electrical properties has triggered hopes in the electronic devices community regarding its exploitation as a channel material in field effect transistors. Graphene is especially promising for devices working at frequencies in the 100 GHz range. So far, graphene field effect transistors (GFETs) have shown cutoff frequencies up to 300 GHz, while exhibiting poor voltage gains, another important figure of merit for analog high frequency applications. In the present work, we show that the voltage gain of GFETs can be improved significantly by using bilayer graphene, where a band gap is introduced through a vertical electric displacement field. At a displacement field of -1.7 V/nm the bilayer GFETs exhibit an intrinsic voltage gain up to 35, a factor of 6 higher than the voltage gain in corresponding monolayer GFETs. The transconductance, which limits the cutoff frequency of a transistor, is not degraded by the displacement field and is similar in both monolayer and bilayer GFETs. Using numerical simulations based on an atomistic p(z) tight-binding Hamiltonian we demonstrate that this approach can be extended to sub-100 nm gate lengths.
具有独特电学性能的石墨烯的出现,引发了电子器件领域对其作为场效应晶体管沟道材料的开发利用的希望。对于工作频率在 100GHz 范围内的器件来说,石墨烯尤为有前景。到目前为止,石墨烯场效应晶体管(GFET)已经显示出高达 300GHz 的截止频率,而在模拟高频应用中,另一个重要的性能指标是电压增益,其性能却很差。在本工作中,我们表明,通过使用双层石墨烯,可以显著提高 GFET 的电压增益,其中通过垂直电位移场引入带隙。在-1.7V/nm 的位移场下,双层 GFET 的固有电压增益高达 35,比相应的单层 GFET 的电压增益高 6 倍。限制晶体管截止频率的跨导并没有被位移场降低,并且在单层和双层 GFET 中都相似。我们使用基于原子 p(z)紧束缚哈密顿量的数值模拟证明,这种方法可以扩展到小于 100nm 的栅长。