Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea.
Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea.
Sci Rep. 2017 Jul 27;7(1):6668. doi: 10.1038/s41598-017-06833-5.
Nanofabrication techniques are essential for exploring nanoscience and many closely related research fields such as materials, electronics, optics and photonics. Recently, three-dimensional (3D) nanofabrication techniques have been actively investigated through many different ways, however, it is still challenging to make elaborate and complex 3D nanostructures that many researchers want to realize for further interesting physics studies and device applications. Electron beam lithography, one of the two-dimensional (2D) nanofabrication techniques, is also feasible to realize elaborate 3D nanostructures by stacking each 2D nanostructures. However, alignment errors among the individual 2D nanostructures have been difficult to control due to some practical issues. In this work, we introduce a straightforward approach to drastically increase the overlay accuracy of sub-20 nm based on carefully designed alignmarks and calibrators. Three different types of 3D nanostructures whose designs are motivated from metamaterials and plasmonic structures have been demonstrated to verify the feasibility of the method, and the desired result has been achieved. We believe our work can provide a useful approach for building more advanced and complex 3D nanostructures.
纳米制造技术对于探索纳米科学以及许多密切相关的研究领域（如材料、电子、光学和光子学）至关重要。最近，通过许多不同的方法，人们积极研究了三维（3D）纳米制造技术，但要制造出许多研究人员想要实现的精细复杂的 3D 纳米结构，仍然具有挑战性，这些 3D 纳米结构可以用于进一步的有趣的物理研究和器件应用。电子束光刻是二维（2D）纳米制造技术之一，通过堆叠每个 2D 纳米结构，也可以实现精细的 3D 纳米结构。然而，由于一些实际问题，各个 2D 纳米结构之间的对准误差难以控制。在这项工作中，我们引入了一种简单的方法，可以通过精心设计的对准标记和校准器，大大提高基于亚 20nm 的套刻精度。已经展示了三种不同类型的 3D 纳米结构，其设计灵感来自于超材料和等离子体结构，以验证该方法的可行性，并且已经达到了预期的结果。我们相信，我们的工作可以为构建更先进和复杂的 3D 纳米结构提供一种有用的方法。
