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用于选择器应用的碲基硫族化物材料。

Te-based chalcogenide materials for selector applications.

作者信息

Velea A, Opsomer K, Devulder W, Dumortier J, Fan J, Detavernier C, Jurczak M, Govoreanu B

机构信息

Imec, Kapeldreef 75, 3001, Heverlee, Belgium.

National Institute of Materials Physics, Atomistilor 405A, P.O. Box M.G. 7, Magurele, 077125, Ilfov, Romania.

出版信息

Sci Rep. 2017 Aug 14;7(1):8103. doi: 10.1038/s41598-017-08251-z.

DOI:10.1038/s41598-017-08251-z
PMID:28808294
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC5556072/
Abstract

The implementation of dense, one-selector one-resistor (1S1R), resistive switching memory arrays, can be achieved with an appropriate selector for correct information storage and retrieval. Ovonic threshold switches (OTS) based on chalcogenide materials are a strong candidate, but their low thermal stability is one of the key factors that prevents rapid adoption by emerging resistive switching memory technologies. A previously developed map for phase change materials is expanded and improved for OTS materials. Selected materials from different areas of the map, belonging to binary Ge-Te and Si-Te systems, are explored. Several routes, including Si doping and reduction of Te amount, are used to increase the crystallization temperature. Selector devices, with areas as small as 55 × 55 nm, were electrically assessed. Sub-threshold conduction models, based on Poole-Frenkel conduction mechanism, are applied to fresh samples in order to extract as-processed material parameters, such as trap height and density of defects, tailoring of which could be an important element for designing a suitable OTS material. Finally, a glass transition temperature estimation model is applied to Te-based materials in order to predict materials that might have the required thermal stability. A lower average number of p-electrons is correlated with a good thermal stability.

摘要

密集型单选择器单电阻(1S1R)电阻式开关存储阵列的实现,可以通过合适的选择器来实现正确的信息存储和检索。基于硫族化物材料的奥氏阈值开关(OTS)是一个有力的候选者,但其低热稳定性是阻碍新兴电阻式开关存储技术迅速采用的关键因素之一。先前为相变材料开发的图谱针对OTS材料进行了扩展和改进。探索了从该图谱不同区域选取的属于二元Ge-Te和Si-Te系统的材料。采用了包括Si掺杂和减少Te含量在内的几种方法来提高结晶温度。对面积小至55×55nm的选择器器件进行了电学评估。基于普尔-弗伦克尔传导机制的亚阈值传导模型应用于新鲜样品,以提取如加工后的材料参数,如陷阱高度和缺陷密度,对其进行调整可能是设计合适的OTS材料的重要因素。最后,将玻璃化转变温度估计模型应用于基于Te的材料,以预测可能具有所需热稳定性的材料。较低的平均p电子数与良好的热稳定性相关。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ab97/5556072/0db034ac8cdc/41598_2017_8251_Fig6_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ab97/5556072/3369c5eae338/41598_2017_8251_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ab97/5556072/6d1ba7e74e75/41598_2017_8251_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ab97/5556072/64a8baaa5f2e/41598_2017_8251_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ab97/5556072/2319295f6744/41598_2017_8251_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ab97/5556072/72891fdb2855/41598_2017_8251_Fig5_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ab97/5556072/0db034ac8cdc/41598_2017_8251_Fig6_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ab97/5556072/3369c5eae338/41598_2017_8251_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ab97/5556072/6d1ba7e74e75/41598_2017_8251_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ab97/5556072/64a8baaa5f2e/41598_2017_8251_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ab97/5556072/2319295f6744/41598_2017_8251_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ab97/5556072/72891fdb2855/41598_2017_8251_Fig5_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ab97/5556072/0db034ac8cdc/41598_2017_8251_Fig6_HTML.jpg

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