Dai Ching-Liang, Chen Ying-Liang
Department of Mechanical Engineering, National Chung Hsing University, 250 Kuo-Kuang Rd., Taichung, 402 Taiwan, R.O.C..
Sensors (Basel). 2007 Nov 9;7(11):2660-2670. doi: 10.3390/s7112670.
This study presents the simulation, fabrication and characterization ofmicromechanical radio frequency (RF) switch with micro inductors. The inductors areemployed to enhance the characteristic of the RF switch. An equivalent circuit model isdeveloped to simulate the performance of the RF switch. The behaviors of themicromechanical RF switch are simulated by the finite element method software,CoventorWare. The micromechanical RF switch is fabricated using the complementarymetal oxide semiconductor (CMOS) and a post-process. The post-process employs a wetetching to etch the sacrificial layer, and to release the suspended structures of the RF switch.The structure of the RF switch contains a coplanar waveguide (CPW), a suspendedmembrane, eight springs and two inductors in series. Experimental results reveal that theinsertion loss and isolation of the switch are 1.7 dB at 21 GHz and 19 dB at 21 GHz,respectively. The driving voltage of the switch is about 13 V.
本研究介绍了带有微型电感的微机械射频(RF)开关的仿真、制造与特性表征。这些电感用于增强射频开关的特性。开发了一个等效电路模型来模拟射频开关的性能。利用有限元方法软件CoventorWare对微机械射频开关的行为进行了仿真。该微机械射频开关采用互补金属氧化物半导体(CMOS)和后处理工艺制造。后处理采用湿法蚀刻来蚀刻牺牲层,并释放射频开关的悬浮结构。射频开关的结构包含一个共面波导(CPW)、一个悬浮膜、八个弹簧和两个串联的电感。实验结果表明,该开关在21GHz时的插入损耗和隔离度分别为1.7dB和19dB。开关的驱动电压约为13V。