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单层 MoS2 中存在缺陷、应变和带电杂质时的弱束缚、带电和自由激子。

Weakly Trapped, Charged, and Free Excitons in Single-Layer MoS in the Presence of Defects, Strain, and Charged Impurities.

机构信息

Univ. Grenoble Alpes, CNRS, Grenoble INP, Institut Néel , 38000 Grenoble, France.

SPEC, CEA, CNRS, Université Paris-Saclay, CEA Saclay , 91191 Gif-sur-Yvette Cedex, France.

出版信息

ACS Nano. 2017 Nov 28;11(11):11206-11216. doi: 10.1021/acsnano.7b05520. Epub 2017 Oct 18.

Abstract

Few- and single-layer MoS host substantial densities of defects. They are thought to influence the doping level, the crystal structure, and the binding of electron-hole pairs. We disentangle the concomitant spectroscopic expression of all three effects and identify to what extent they are intrinsic to the material or extrinsic to it, i.e., related to its local environment. We do so by using different sources of MoS-a natural one and one prepared at high pressure and high temperature-and different substrates bringing varying amounts of charged impurities and by separating the contributions of internal strain and doping in Raman spectra. Photoluminescence unveils various optically active excitonic complexes. We discover a defect-bound state having a low binding energy of 20 meV that does not appear sensitive to strain and doping, unlike charged excitons. Conversely, the defect does not significantly dope or strain MoS. Scanning tunneling microscopy and density functional theory simulations point to substitutional atoms, presumably individual nitrogen atoms at the sulfur site. Our work shows the way to a systematic understanding of the effect of external and internal fields on the optical properties of two-dimensional materials.

摘要

少层和单层 MoS 中存在大量的缺陷。人们认为这些缺陷会影响掺杂水平、晶体结构和电子-空穴对的结合。我们厘清了这三种效应的同时出现的光谱表现,并确定了它们在多大程度上是材料本身固有的,或者是由其局部环境引起的外部因素。我们通过使用不同来源的 MoS(一种是天然的,一种是在高温高压下制备的)和不同的衬底,这些衬底带来了不同数量的带电杂质,并通过分离拉曼光谱中内应变和掺杂的贡献来做到这一点。光致发光揭示了各种光活性激子复合物。我们发现了一个具有低结合能 20meV 的缺陷束缚态,它不像带电激子那样对应变和掺杂不敏感。相反,该缺陷对 MoS 没有显著的掺杂或应变作用。扫描隧道显微镜和密度泛函理论模拟表明,缺陷可能是单个氮原子取代了硫位上的原子。我们的工作为系统地理解二维材料的外部和内部场对其光学性质的影响指明了方向。

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