Eom Nu Si A, Cho Hong-Baek, Song Yoseb, Lee Woojin, Sekino Tohru, Choa Yong-Ho
Department of Fusion Chemical Engineering, Hanyang University, Ansan 15588, Korea.
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd., Samsungjeonja-ro 1, Hwaseong, Gyeonggi-do 445-330, Korea.
Sensors (Basel). 2017 Nov 28;17(12):2750. doi: 10.3390/s17122750.
In this study, a graphene-doped porous silicon (G-doped/p-Si) substrate for low ppm H₂ gas detection by an inexpensive synthesis route was proposed as a potential noble graphene-based gas sensor material, and to understand the sensing mechanism. The G-doped/p-Si gas sensor was synthesized by a simple capillary force-assisted solution dropping method on p-Si substrates, whose porosity was generated through an electrochemical etching process. G-doped/p-Si was fabricated with various graphene concentrations and exploited as a H₂ sensor that was operated at room temperature. The sensing mechanism of the sensor with/without graphene decoration on p-Si was proposed to elucidate the synergetic gas sensing effect that is generated from the interface between the graphene and p-type silicon.
在本研究中,通过一种廉价的合成路线制备了用于低ppm H₂气体检测的石墨烯掺杂多孔硅(G掺杂/p-Si)衬底,将其作为一种潜在的基于石墨烯的贵金属气体传感器材料,并探究其传感机制。G掺杂/p-Si气体传感器通过一种简单的毛细作用力辅助溶液滴涂法在p-Si衬底上合成,该衬底的孔隙率是通过电化学蚀刻工艺产生的。制备了具有不同石墨烯浓度的G掺杂/p-Si,并将其用作在室温下工作的H₂传感器。提出了在p-Si上有无石墨烯修饰时传感器的传感机制,以阐明由石墨烯与p型硅之间的界面产生的协同气体传感效应。