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通过简便的溶液滴加法对石墨烯掺杂多孔硅进行室温氢气传感特性研究

Room-Temperature H₂ Gas Sensing Characterization of Graphene-Doped Porous Silicon via a Facile Solution Dropping Method.

作者信息

Eom Nu Si A, Cho Hong-Baek, Song Yoseb, Lee Woojin, Sekino Tohru, Choa Yong-Ho

机构信息

Department of Fusion Chemical Engineering, Hanyang University, Ansan 15588, Korea.

Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd., Samsungjeonja-ro 1, Hwaseong, Gyeonggi-do 445-330, Korea.

出版信息

Sensors (Basel). 2017 Nov 28;17(12):2750. doi: 10.3390/s17122750.

Abstract

In this study, a graphene-doped porous silicon (G-doped/p-Si) substrate for low ppm H₂ gas detection by an inexpensive synthesis route was proposed as a potential noble graphene-based gas sensor material, and to understand the sensing mechanism. The G-doped/p-Si gas sensor was synthesized by a simple capillary force-assisted solution dropping method on p-Si substrates, whose porosity was generated through an electrochemical etching process. G-doped/p-Si was fabricated with various graphene concentrations and exploited as a H₂ sensor that was operated at room temperature. The sensing mechanism of the sensor with/without graphene decoration on p-Si was proposed to elucidate the synergetic gas sensing effect that is generated from the interface between the graphene and p-type silicon.

摘要

在本研究中,通过一种廉价的合成路线制备了用于低ppm H₂气体检测的石墨烯掺杂多孔硅(G掺杂/p-Si)衬底,将其作为一种潜在的基于石墨烯的贵金属气体传感器材料,并探究其传感机制。G掺杂/p-Si气体传感器通过一种简单的毛细作用力辅助溶液滴涂法在p-Si衬底上合成,该衬底的孔隙率是通过电化学蚀刻工艺产生的。制备了具有不同石墨烯浓度的G掺杂/p-Si,并将其用作在室温下工作的H₂传感器。提出了在p-Si上有无石墨烯修饰时传感器的传感机制,以阐明由石墨烯与p型硅之间的界面产生的协同气体传感效应。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/520c/5751383/96cea9678dfc/sensors-17-02750-g002.jpg

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