Key Laboratory for the Physics and Chemistry of Nanodevices and Department of Electronics, Peking University , Beijing 100871, China.
ACS Nano. 2018 Jan 23;12(1):627-634. doi: 10.1021/acsnano.7b07665. Epub 2018 Jan 11.
Although chemical vapor deposition (CVD)-grown carbon nanotube (CNT) arrays are considered ideal materials for constructing high-performance field-effect transistors (FETs) and integrated circuits (ICs), a significant gap remains between the required and achieved densities and purities of CNT arrays. Here, we develop a directional shrinking transfer method to realize up to 10-fold density amplification of CNT array films without introducing detectable damage or defects. In addition, the method improves the film uniformity while retaining the perfect alignment and high carrier mobility of 1600 cm V s of CVD-grown CNT arrays. By combining the density amplification method with the thermocapillary flow method developed by Rogers et al., semiconducting CNT arrays with high densities and high qualities are obtained. High-performance FETs with a channel length of 200 nm are demonstrated using these high-density semiconducting CNT arrays, yielding a record-high on-state current density of 150 μA/μm, a peak transconductance of 80 μS/μm, and a current on/off ratio of more than 10 among the CVD-grown CNT-based FETs.
虽然化学气相沉积 (CVD) 生长的碳纳米管 (CNT) 阵列被认为是构建高性能场效应晶体管 (FET) 和集成电路 (IC) 的理想材料,但 CNT 阵列所需的和已实现的密度和纯度之间仍存在显著差距。在这里,我们开发了一种定向收缩转移方法,可将 CNT 阵列薄膜的密度提高 10 倍以上,而不会引入可检测的损伤或缺陷。此外,该方法在保留 CVD 生长 CNT 阵列的完美对准和高载流子迁移率 1600 cm V s 的同时,提高了薄膜的均匀性。通过将密度放大方法与 Rogers 等人开发的热毛细流方法相结合,获得了具有高密度和高质量的半导体 CNT 阵列。使用这些高密度半导体 CNT 阵列演示了高性能 FET,其沟道长度为 200nm,具有 150μA/μm 的创纪录高导通电流密度、80μS/μm 的峰值跨导和高于 10 的电流开关比,这是在 CVD 生长的 CNT 基 FET 中实现的。