Department of Chemistry and the Materials Research Center , Northwestern University , 2145 Sheridan Road , Evanston , Illinois 60208 , United States.
State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information , University of Electronic Science and Technology of China (UESTC) , Chengdu 610054 , China.
J Am Chem Soc. 2018 Apr 25;140(16):5457-5473. doi: 10.1021/jacs.8b01252. Epub 2018 Apr 13.
Charge transport and film microstructure evolution are investigated in a series of polyethylenimine (PEI)-doped (0.0-6.0 wt%) amorphous metal oxide (MO) semiconductor thin film blends. Here, PEI doping generality is broadened from binary InO to ternary (e.g., In+Zn in IZO, In+Ga in IGO) and quaternary (e.g., In+Zn+Ga in IGZO) systems, demonstrating the universality of this approach for polymer electron doping of MO matrices. Systematic comparison of the effects of various metal ions on the electronic transport and film microstructure of these blends are investigated by combined thin-film transistor (TFT) response, AFM, XPS, XRD, X-ray reflectivity, and cross-sectional TEM. Morphological analysis reveals that layered MO film microstructures predominate in PEI-InO, but become less distinct in IGO and are not detectable in IZO and IGZO. TFT charge transport measurements indicate a general coincidence of a peak in carrier mobility (μ) and overall TFT performance at optimal PEI doping concentrations. Optimal PEI loadings that yield μ values depend not only on the MO elemental composition but also, equally important, on the metal atomic ratios. By investigating the relationship between the MO energy levels and PEI doping by UPS, it is concluded that the efficiency of PEI electron-donation is highly dependent on the metal oxide matrix work function in cases where film morphology is optimal, as in the IGO compositions. The results of this investigation demonstrate the broad generality and efficacy of PEI electron doping applied to electronically functional metal oxide systems and that the resulting film microstructure, morphology, and energy level modifications are all vital to understanding charge transport in these amorphous oxide blends.
电荷传输和薄膜微结构演变在一系列聚乙二胺(PEI)掺杂(0.0-6.0wt%)非晶金属氧化物(MO)半导体薄膜混合物中进行了研究。在这里,PEI 掺杂的通用性从二元 InO 扩展到三元(例如,IZO 中的 In+Zn,IGO 中的 In+Ga)和四元(例如,IGZO 中的 In+Zn+Ga)系统,证明了这种方法对于 MO 基质聚合物电子掺杂的普遍性。通过结合薄膜晶体管(TFT)响应、原子力显微镜(AFM)、X 射线光电子能谱(XPS)、X 射线衍射(XRD)、X 射线反射率和横截面透射电子显微镜(TEM),系统地比较了各种金属离子对这些混合物电子传输和薄膜微结构的影响。形态分析表明,在 PEI-InO 中,MO 薄膜的层状微结构占主导地位,但在 IGO 中则不那么明显,在 IZO 和 IGZO 中则无法检测到。TFT 电荷传输测量表明,在最佳 PEI 掺杂浓度下,载流子迁移率(μ)和整体 TFT 性能的峰值普遍一致。产生μ值的最佳 PEI 负载不仅取决于 MO 元素组成,而且同样重要的是,取决于金属原子比。通过研究 UPS 中 MO 能级和 PEI 掺杂之间的关系,可以得出结论,在薄膜形貌最佳的情况下,PEI 电子供体的效率高度依赖于金属氧化物基质的功函数,如在 IGO 组成中。这项研究的结果表明,PEI 电子掺杂在电子功能金属氧化物系统中具有广泛的通用性和有效性,并且所得的薄膜微结构、形态和能级修饰对于理解这些非晶氧化物混合物中的电荷传输都是至关重要的。