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确定420纳米强脉冲光对红色毛癣菌体外生长的最佳参数。

Determining the optimal parameters of 420-nm intense pulsed light on Trichophyton rubrum growth in vitro.

作者信息

Huang Hao, Tang Hongfeng, Huang Meiling, Zheng Xiufen, Wang Ruihua, Hu Yong, Lv Wenyi

机构信息

Department of Dermatology, Shunde Hospital, Southern Medical University, Foshan, 528300, China.

出版信息

Lasers Med Sci. 2018 Nov;33(8):1667-1671. doi: 10.1007/s10103-018-2512-y. Epub 2018 Apr 23.

Abstract

The effect of and the optimal parameters for intense pulsed light (IPL) with a 420-nm filter on an isolate of the fungus Trichophyton rubrum (T. rubrum) were examined in vitro. Colonies of T. rubrum were irradiated by using 420-nm IPL with various pulse numbers and energies. Colony areas were photographed and compared with those of untreated colonies to assess growth inhibition. Statistically significant inhibition of T. rubrum growth was detected in colonies treated with 12 pulses of greater than or equal to 12 J/cm. The optimal parameters of 420-nm IPL were 12 pulses of 12 J/cm. However, more in vitro and in vivo studies are necessary to investigate and explore this mechanism to determine whether IPL would have a potential use in the treatment of fungal infections of the skin.

摘要

体外研究了使用420纳米滤光片的强脉冲光(IPL)对红色毛癣菌(T. rubrum)分离株的作用及最佳参数。用不同脉冲数和能量的420纳米IPL照射红色毛癣菌菌落。拍摄菌落面积并与未处理菌落的面积进行比较,以评估生长抑制情况。在用12个脉冲且能量大于或等于12 J/cm²处理的菌落中,检测到红色毛癣菌生长受到统计学上的显著抑制。420纳米IPL的最佳参数是12个脉冲、12 J/cm²。然而,需要更多的体外和体内研究来调查和探索这种机制,以确定IPL在治疗皮肤真菌感染方面是否具有潜在用途。

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