School of Chemical Engineering and Technology, Sun Yat-Sen University, Zhuhai, 519082, China.
Institute for Molecular Engineering, University of Chicago, Chicago, IL 60637, USA and Chemical Sciences and Engineering Division, Argonne National Laboratory, Lemont, IL 60439, USA.
Nanoscale. 2018 Nov 15;10(44):20505-20513. doi: 10.1039/c8nr08114j.
In many applications, interfaces govern the performance of membranes. Structure, chemistry, electrostatics, and other properties of interfaces can dominate the selectivity, flux, fouling resistance, and other critical aspects of membrane functionality. Control over membrane interfacial properties, therefore, is a powerful means of tailoring performance. In this Minireview, we discuss the application of atomic layer deposition (ALD) and related techniques in the design of novel membrane interfaces. We discuss recent literature in which ALD is used to (1) modify the surface chemistry and interfacial properties of membranes, (2) tailor the pore sizes and separation characteristics of membranes, and (3) enable novel advanced functional membranes.
在许多应用中，界面控制着膜的性能。界面的结构、化学性质、静电特性和其他性质可以主导膜功能的选择性、通量、抗污染性和其他关键方面。因此，对膜界面性质的控制是一种调整性能的有效手段。在这篇综述中，我们讨论了原子层沉积（ALD）和相关技术在新型膜界面设计中的应用。我们讨论了最近的文献，其中 ALD 被用于：（1）修饰膜的表面化学和界面性质；（2）调整膜的孔径和分离特性；（3）实现新型先进功能膜。
