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用于宽带隙逻辑应用的具有陡峭亚阈值斜率的β-GaO纳米膜负电容场效应晶体管

β-GaO Nanomembrane Negative Capacitance Field-Effect Transistors with Steep Subthreshold Slope for Wide Band Gap Logic Applications.

作者信息

Si Mengwei, Yang Lingming, Zhou Hong, Ye Peide D

机构信息

School of Electrical and Computer Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907, United States.

出版信息

ACS Omega. 2017 Oct 25;2(10):7136-7140. doi: 10.1021/acsomega.7b01289. eCollection 2017 Oct 31.

Abstract

Steep-slope β-GaO nanomembrane negative capacitance field-effect transistors (NC-FETs) are demonstrated with ferroelectric hafnium zirconium oxide in the gate dielectric stack. Subthreshold slope less than 60 mV/dec at room temperature is obtained for both forward and reverse gate-voltage sweeps with a minimum value of 34.3 mV/dec at the reverse gate-voltage sweep and 53.1 mV/dec at the forward gate-voltage sweep at = 0.5 V. Enhancement-mode operation with a threshold voltage of ∼0.4 V is achieved by tuning the thickness of the β-GaO membrane. Low hysteresis of less than 0.1 V is obtained. The steep-slope, low hysteresis, and enhancement-mode β-GaO NC-FETs are promising as an nFET candidate for future wide band gap complementary metal-oxide-semiconductor logic applications.

摘要

在栅极介质堆栈中采用铁电铪锆氧化物展示了陡坡β-GaO纳米膜负电容场效应晶体管(NC-FET)。在室温下,正向和反向栅极电压扫描的亚阈值斜率均小于60 mV/dec,在反向栅极电压扫描时最小值为34.3 mV/dec,在正向栅极电压扫描且Vds = 0.5 V时为53.1 mV/dec。通过调整β-GaO膜的厚度实现了阈值电压约为0.4 V的增强模式操作。获得了小于0.1 V的低滞后现象。具有陡坡、低滞后和增强模式的β-GaO NC-FET作为未来宽带隙互补金属氧化物半导体逻辑应用的nFET候选者很有前景。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/949f/6645059/d00e62f20e86/ao-2017-012894_0001.jpg

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