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纳米压印回流法对硫系玻璃中的蛾眼结构进行改性,以增强中红外波段的宽带减反射性能。

Nanoimprinting reflow modified moth-eye structures in chalcogenide glass for enhanced broadband antireflection in the mid-infrared.

作者信息

Lotz Mikkel, Needham Julius, Jakobsen Mogens H, Taboryski Rafael

出版信息

Opt Lett. 2019 Sep 1;44(17):4383-4386. doi: 10.1364/OL.44.004383.

DOI:10.1364/OL.44.004383
PMID:31465408
Abstract

We report on the progress towards developing a new method for fabricating more efficient, broadband antireflective (AR) moth-eye structures in via a direct nanoimprinting technique. Thermal reflow is used during mold fabrication to reshape a conventional deep-ultraviolet lithography in order to promote a pattern transfer of "secant ogive"-like moth-eye structures. Once replicated, structures modified by reflow displayed greater AR efficiency compared to structures replicated by a conventional mold, achieving the highest spectrum-averaged transmittance improvement of 12.36% from 3.3 to 12 μm.

摘要

我们报告了通过直接纳米压印技术在[具体材料]中开发一种制造更高效宽带抗反射(AR)蛾眼结构新方法的进展。在模具制造过程中使用热回流来重塑传统的深紫外光刻,以促进“正割卵形线”状蛾眼结构的图案转移。一旦复制完成,与通过传统模具复制的结构相比,经热回流修饰的结构显示出更高的抗反射效率,在3.3至12μm范围内实现了最高12.36%的光谱平均透过率提升。

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