Haq Muhammad Refatul, Kim Jun, Yeom Jeong-Woo, Ryu Saem, Asgar Md Ali, Kim Young Kyu, Kim Seok-Min
Department of Mechanical Engineering, Chung-Ang University, Heukseok-dong, Dongjak-gu, Seoul 06974, Korea.
Micromachines (Basel). 2020 Jan 25;11(2):136. doi: 10.3390/mi11020136.
Although polymer nanoimprinting on glass substrates has been widely employed for the fabrication of functional anti-reflective (AR) nanostructures, several drawbacks exist with respect to durability and delamination. The direct patterning of glass material is a potential solution for outdoor applications that require AR functional nanostructured glass plates. In this study, a glass imprinting technique was employed for the fabrication of an AR nanostructure on a soda-lime glass substrate using a vitreous carbon (VC) stamp. The VC stamp, which had a high aspect ratio nanopost array with a pitch of 325 nm, diameter of 110 nm, and height of ~220 nm, was fabricated by the carbonization of a replicated Furan precursor from an Si master. During the glass imprinting process using the nanopost array VC stamp, the softened glass material gradually protruded into the spaces between the nanopins owing to viscoelastic behavior, and one can achieve a cross-sinusoidal surface relief under specific imprinting condition, which can be used as an AR nanostructure with a gradually increasing refractive index. The effects of the processing temperature on the surface profile of the glass imprinted parts and the measured transmission spectra were analyzed, and a glass imprinting temperature of 700 °C and pressure of 1 MPa were found to be the optimum condition. The height of the fabricated cross-sinusoidal nanostructure was 80 nm, and the light transmission was increased by ~2% over the entire visible-light range. Furthermore, the measured transmission spectrum observed to be in good agreement with the simulation results.
尽管聚合物纳米压印在玻璃基板上已被广泛用于制造功能性抗反射（AR）纳米结构，但在耐久性和分层方面仍存在一些缺点。玻璃材料的直接图案化是户外应用中需要AR功能纳米结构玻璃板的潜在解决方案。在本研究中，采用玻璃压印技术，使用玻璃碳（VC）印章在钠钙玻璃基板上制造AR纳米结构。该VC印章具有高纵横比的纳米柱阵列，其间距为325nm，直径为110nm，高度约为220nm，通过从硅母版复制的呋喃前驱体碳化制成。在使用纳米柱阵列VC印章的玻璃压印过程中，由于粘弹性行为，软化的玻璃材料逐渐突出到纳米柱之间的空间中，并且在特定的压印条件下可以实现交叉正弦表面起伏，其可以用作具有逐渐增加的折射率的AR纳米结构。分析了加工温度对玻璃压印部件表面轮廓和测量的透射光谱产生的影响，发现700℃的玻璃压印温度和1MPa的压力是最佳条件。所制造的交叉正弦纳米结构的高度为80nm，并且在整个可见光范围内光透射率提高了约2％。此外，观察到测量的透射光谱与模拟结果良好吻合。
