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通过基于气泡的激光诱导正向转移印刷皱缩的化学气相沉积石墨烯

Printing of Crumpled CVD Graphene via Blister-Based Laser-Induced Forward Transfer.

作者信息

Komlenok Maxim S, Pivovarov Pavel A, Dezhkina Margarita A, Rybin Maxim G, Savin Sergey S, Obraztsova Elena D, Konov Vitaly I

机构信息

Prokhorov General Physics Institute of the Russian Academy of Sciences, Vavilova Street 38, 119991 Moscow, Russia.

MIREA - Russian Technological University, -Vernadsky Avenue 78, 119454 Moscow, Russia.

出版信息

Nanomaterials (Basel). 2020 Jun 2;10(6):1103. doi: 10.3390/nano10061103.

Abstract

The patterning and transfer of a two-dimensional graphene film without damaging its original structure is an urgent and difficult task. For this purpose, we propose the use of the blister-based laser-induced forward transfer (BB-LIFT), which has proven itself in the transfer of such delicate materials. The ease of implementation of laser techniques reduces the number of intermediate manipulations with a graphene film, increasing its safety. The work demonstrates the promise of BB-LIFT of single-layer graphene from a metal surface to a SiO/Si substrate. The effect of the parameters of this method on the structure of transferred graphene islands is investigated. The relevance of reducing the distance between irradiating and receiving substrates for the transfer of free-lying graphene is demonstrated. The reasons for the damage to the integrity of the carbon film observed in the experiments are discussed. The preservation of the original crystal structure of transferred graphene is confirmed by Raman spectroscopy.

摘要

在不破坏二维石墨烯薄膜原始结构的情况下对其进行图案化和转移是一项紧迫且困难的任务。为此,我们提出使用基于泡状结构的激光诱导正向转移(BB-LIFT)方法,该方法在转移此类易碎材料方面已得到验证。激光技术易于实施,减少了对石墨烯薄膜的中间操作次数,提高了其安全性。这项工作展示了将单层石墨烯从金属表面通过BB-LIFT转移到SiO/Si衬底上的前景。研究了该方法的参数对转移的石墨烯岛结构的影响。证明了减小照射和接收衬底之间的距离对于转移自由放置的石墨烯的相关性。讨论了实验中观察到的碳膜完整性受损的原因。通过拉曼光谱证实了转移的石墨烯原始晶体结构得以保留。

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