Safi Ihab Nabeel, Hussein Basima Mohammed Ali, Aljudy Hikmat J, Tukmachi Mustafa S
Department of Prosthodontics, College of Dentistry, University of Baghdad, Baghdad, Iraq.
Department of Biomedical Applications, Institute of Laser for Postgraduate Studies, University of Baghdad, Baghdad, Iraq.
Eur J Dent. 2021 Jul;15(3):440-447. doi: 10.1055/s-0040-1721314. Epub 2021 Jan 28.
Dental implant is a revolution in dentistry; some shortages are still a focus of research. This study use long duration of radiofrequency (RF)-magnetron sputtering to coat titanium (Ti) implant with hydroxyapatite (HA) to obtain a uniform, strongly adhered in a few micrometers in thickness.
Two types of substrates, discs and root form cylinders were prepared using a grade 1 commercially pure (CP) Ti rod. A RF-magnetron sputtering device was used to coat specimens with HA. Magnetron sputtering was set at 150 W for 22 hours at 100°C under continuous argon gas flow and substrate rotation at 10 rpm. Coat properties were evaluated via field emission scanning electron microscopy (FESEM), scanning electron microscopy-energy dispersive X-ray (EDX) analysis, atomic force microscopy, and Vickers hardness (VH). Student's -test was used.
All FESEM images showed a homogeneous, continuous, and crack-free HA coat with a rough surface. EDX analysis revealed inclusion of HA particles within the substrate surface in a calcium (Ca)/phosphorus (P) ratio (16.58/11.31) close to that of HA. Elemental and EDX analyses showed Ca, Ti, P, and oxygen within Ti. The FESEM views at a cross-section of the substrate showed an average of 7 µm coat thickness. Moreover, these images revealed a dense, compact, and uniform continuous adhesion between the coat layer and the substrate. Roughness result indicated highly significant difference between uncoated Ti and HA coat (p-value < 0.05). A significant improvement in the VH value was observed when coat hardness was compared with the Ti substrate hardness (p-value < 0.05).
Prolonged magnetron sputtering successfully coat Ti dental implants with HA in micrometers thickness which is well adhered essentially in excellent osseointegration.
牙种植体是牙科领域的一项变革；但其一些不足之处仍是研究的重点。本研究采用长时间射频（RF）磁控溅射法在钛（Ti）种植体表面涂覆羟基磷灰石（HA），以获得均匀、牢固附着且厚度为几微米的涂层。
使用1级商业纯钛（CP）棒制备两种类型的基底，即圆盘和牙根形圆柱体。采用射频磁控溅射装置在标本表面涂覆HA。磁控溅射在100°C、连续氩气流且基底以10 rpm旋转的条件下，设定功率为150 W，持续22小时。通过场发射扫描电子显微镜（FESEM）、扫描电子显微镜 - 能量色散X射线（EDX）分析、原子力显微镜和维氏硬度（VH）评估涂层性能。采用学生t检验。
所有FESEM图像均显示HA涂层均匀、连续且无裂纹，表面粗糙。EDX分析表明基底表面存在HA颗粒，钙（Ca）/磷（P）比（16.58/11.31）接近HA。元素分析和EDX分析显示Ti中含有Ca、Ti、P和氧。基底横截面的FESEM图像显示涂层平均厚度为7 µm。此外，这些图像显示涂层与基底之间有致密、紧密且均匀的连续附着。粗糙度结果表明未涂覆Ti和HA涂层之间存在极显著差异（p值< 0.05）。将涂层硬度与Ti基底硬度进行比较时，VH值有显著提高（p值< 0.05）。
长时间磁控溅射成功地在Ti牙种植体表面涂覆了微米级厚度的HA，其附着良好，对骨整合极为有利。
