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介电工程二维神经形态晶体管。

Dielectric Engineered Two-Dimensional Neuromorphic Transistors.

机构信息

Frontier Institute of Chip and System, Fudan University, Shanghai 200438, China.

Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 200433, China.

出版信息

Nano Lett. 2021 Apr 28;21(8):3557-3565. doi: 10.1021/acs.nanolett.1c00492. Epub 2021 Apr 9.

DOI:10.1021/acs.nanolett.1c00492
PMID:33835807
Abstract

Two-dimensional (2D) materials, which exhibit planar-wafer technique compatibility and pure electrically triggered communication, have established themselves as potential candidates in neuromorphic architecture integration. However, the current 2D artificial synapses are mainly realized at a single-device level, where the development of 2D scalable synaptic arrays with complementary metal-oxide-semiconductor compatibility remains challenging. Here, we report a 2D transition metal dichalcogenide-based synaptic array fabricated on commercial silicon-rich silicon nitride (sr-SiN) substrate. The array demonstrates uniform performance with sufficiently high analogue on/off ratio and linear conductance update, and low cycle-to-cycle variability (1.5%) and device-to-device variability (5.3%), which are essential for neuromorphic hardware implementation. On the basis of the experimental data, we further prove that the artificial synapses can achieve a recognition accuracy of 91% on the MNIST handwritten data set. Our findings offer a simple approach to achieve 2D synaptic arrays by using an industry-compatible sr-SiN dielectric, promoting a brand-new paradigm of 2D materials in neuromorphic computing.

摘要

二维(2D)材料具有平面晶圆技术兼容性和纯电触发通信,已成为神经形态架构集成的潜在候选材料。然而,目前的 2D 人工突触主要在单个器件层面实现,而具有互补金属氧化物半导体兼容性的 2D 可扩展突触阵列的开发仍然具有挑战性。在这里,我们报告了一种在商业富硅氮化硅(sr-SiN)衬底上制造的基于二维过渡金属二卤化物的突触阵列。该阵列表现出均匀的性能,具有足够高的模拟导通/截止比和线性电导更新,以及低的循环间变化率(1.5%)和器件间变化率(5.3%),这对于神经形态硬件实现至关重要。基于实验数据,我们进一步证明人工突触可以在手写数字 MNIST 数据集上实现 91%的识别准确率。我们的研究结果提供了一种简单的方法,可以使用与工业兼容的 sr-SiN 电介质来实现 2D 突触阵列,推动了 2D 材料在神经形态计算中的全新范例。

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