Chen Jing, Sun Ming-Yuan, Wang Zhen-Hua, Zhang Zheng, Zhang Kai, Wang Shuai, Zhang Yu, Wu Xiaoming, Ren Tian-Ling, Liu Hong, Han Lin
Institute of Marine Science and Technology, Shandong University, Qingdao, 266237, Shandong, People's Republic of China.
BNRist, Tsinghua University, Beijing, 100084, People's Republic of China.
Nanomicro Lett. 2024 Aug 9;16(1):264. doi: 10.1007/s40820-024-01461-x.
Two-dimensional (2D) transition metal dichalcogenides (TMDs) allow for atomic-scale manipulation, challenging the conventional limitations of semiconductor materials. This capability may overcome the short-channel effect, sparking significant advancements in electronic devices that utilize 2D TMDs. Exploring the dimension and performance limits of transistors based on 2D TMDs has gained substantial importance. This review provides a comprehensive investigation into these limits of the single 2D-TMD transistor. It delves into the impacts of miniaturization, including the reduction of channel length, gate length, source/drain contact length, and dielectric thickness on transistor operation and performance. In addition, this review provides a detailed analysis of performance parameters such as source/drain contact resistance, subthreshold swing, hysteresis loop, carrier mobility, on/off ratio, and the development of p-type and single logic transistors. This review details the two logical expressions of the single 2D-TMD logic transistor, including current and voltage. It also emphasizes the role of 2D TMD-based transistors as memory devices, focusing on enhancing memory operation speed, endurance, data retention, and extinction ratio, as well as reducing energy consumption in memory devices functioning as artificial synapses. This review demonstrates the two calculating methods for dynamic energy consumption of 2D synaptic devices. This review not only summarizes the current state of the art in this field but also highlights potential future research directions and applications. It underscores the anticipated challenges, opportunities, and potential solutions in navigating the dimension and performance boundaries of 2D transistors.
二维(2D)过渡金属二硫属化物(TMD)允许进行原子尺度的操控,这对半导体材料的传统限制提出了挑战。这种能力可能克服短沟道效应,推动利用二维TMD的电子器件取得重大进展。探索基于二维TMD的晶体管的尺寸和性能极限已变得极为重要。本综述对单个二维TMD晶体管的这些极限进行了全面研究。它深入探讨了小型化的影响,包括沟道长度、栅极长度、源极/漏极接触长度以及介电层厚度的减小对晶体管工作和性能的影响。此外,本综述还对源极/漏极接触电阻、亚阈值摆幅、滞后回线、载流子迁移率、开/关比等性能参数以及p型和单逻辑晶体管的发展进行了详细分析。本综述详细介绍了单个二维TMD逻辑晶体管的两种逻辑表达式,包括电流和电压。它还强调了基于二维TMD的晶体管作为存储器件的作用,重点在于提高存储操作速度、耐久性、数据保持能力和消光比,以及降低用作人工突触的存储器件中的能耗。本综述展示了二维突触器件动态能耗的两种计算方法。本综述不仅总结了该领域的当前技术现状,还突出了潜在的未来研究方向和应用。它强调了在探索二维晶体管的尺寸和性能边界时预期会遇到的挑战、机遇和潜在解决方案。