Baghdadi Reza, Gould Michael, Gupta Shashank, Tymchenko Mykhailo, Bunandar Darius, Ramey Carl, Harris Nicholas C
Opt Express. 2021 Jun 7;29(12):19113-19119. doi: 10.1364/OE.423949.
Photonic system component counts are increasing rapidly, particularly in CMOS-compatible silicon photonics processes. Large numbers of cascaded active photonic devices are difficult to implement when accounting for constraints on area, power dissipation, and response time. Plasma dispersion and the thermo-optic effect, both available in CMOS-compatible silicon processes, address a subset of these criteria. With the addition of a few back-end-of-line etch processing steps, silicon photonics platforms can support nano-opto-electro-mechanical (NOEM) phase shifters. Realizing NOEM phase shifters that operate at CMOS-compatible voltages (≤ 1.2 V) and with low insertion loss remains a challenge. Here, we introduce a novel NOEM phase shifter fabricated alongside 90 nanometer transistors that imparts 5.63 radians phase shift at 1.08 volts bias over an actuation length of 25μm with an insertion loss of less than 0.04 dB and 3 dB bandwidth of 0.26 MHz.
光子系统的组件数量正在迅速增加,尤其是在与CMOS兼容的硅光子工艺中。考虑到面积、功耗和响应时间的限制,大量级联有源光子器件难以实现。等离子体色散和热光效应在与CMOS兼容的硅工艺中均可用,可满足这些标准中的一部分。通过增加一些后端蚀刻处理步骤,硅光子平台可以支持纳米光机电(NOEM)移相器。实现工作在与CMOS兼容电压(≤1.2V)且插入损耗低的NOEM移相器仍然是一个挑战。在此,我们介绍一种与90纳米晶体管一起制造的新型NOEM移相器,该移相器在1.08伏偏置电压下,在25μm的驱动长度上可产生5.63弧度的相移,插入损耗小于0.04dB,3dB带宽为0.26MHz。