Wang Xiujun, Song Sannian, Wang Haomin, Guo Tianqi, Xue Yuan, Wang Ruobing, Wang HuiShan, Chen Lingxiu, Jiang Chengxin, Chen Chen, Shi Zhiyuan, Wu Tianru, Song Wenxiong, Zhang Sifan, Watanabe Kenji, Taniguchi Takashi, Song Zhitang, Xie Xiaoming
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 865 Changning Road, Shanghai, 200050, P. R. China.
Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, 100049, P. R. China.
Adv Sci (Weinh). 2022 Sep;9(25):e2202222. doi: 10.1002/advs.202202222. Epub 2022 Jul 18.
Nonvolatile phase-change random access memory (PCRAM) is regarded as one of the promising candidates for emerging mass storage in the era of Big Data. However, relatively high programming energy hurdles the further reduction of power consumption in PCRAM. Utilizing narrow edge-contact of graphene can effectively reduce the active volume of phase change material in each cell, and therefore realize low-power operation. Here, it demonstrates that the power consumption can be reduced to ≈53.7 fJ in a cell with ≈3 nm-wide graphene nanoribbon (GNR) as edge-contact, whose cross-sectional area is only ≈1 nm . It is found that the polarity of the bias pulse determines its cycle endurance in the asymmetric structure. If a positive bias is applied to the graphene electrode, the endurance can be extended at least one order longer than the case with a reversal of polarity. In addition, the introduction of the hexagonal boron nitride (h-BN) multilayer leads to a low resistance drift and a high programming speed in a memory cell. The work represents a great technological advance for the low-power PCRAM and can benefit in-memory computing in the future.
非易失性相变随机存取存储器(PCRAM)被认为是大数据时代新兴大容量存储的有前途的候选者之一。然而,相对较高的编程能量阻碍了PCRAM功耗的进一步降低。利用石墨烯的窄边缘接触可以有效减少每个单元中相变材料的有源体积,从而实现低功耗运行。在此,研究表明,在以约3纳米宽的石墨烯纳米带(GNR)作为边缘接触的单元中,功耗可降低至约53.7飞焦,其横截面积仅约为1纳米²。研究发现,在不对称结构中,偏置脉冲的极性决定其循环耐久性。如果向石墨烯电极施加正偏压,其耐久性可比极性反转的情况延长至少一个数量级。此外,引入六方氮化硼(h-BN)多层膜可导致存储单元中的低电阻漂移和高编程速度。这项工作代表了低功耗PCRAM的一项重大技术进步,未来可惠及内存计算。