Zhang Xiaomeng, Liu Yu, Yao Chuhao, Niu Jiebin, Li Hailiang, Xie Changqing
Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences Beijing 100029 People's Republic of China
University of Chinese Academy of Sciences Beijing 100049 People's Republic of China.
Nanoscale Adv. 2022 Nov 3;5(1):142-152. doi: 10.1039/d2na00637e. eCollection 2022 Dec 20.
Three-dimensional (3D) silicon (Si) nanostructures have attracted much attention in solar cells due to their excellent broadband and omnidirectional light-harvesting properties. However, the development of 3D Si nanostructures is still plagued by the trade-off between structural complexity and fabrication difficulty. Herein, we proposed a facile and stable approach toward the fabrication of wafer-scale, ultra-black crystalline silicon (c-Si) with nano/micro hybrid structures. The distinguishing advantage of this approach is that it allows the formation of 3D Si nano/micro hybrid structures in a single-round process, avoiding the need for multiple iterations of lithography, coating, and etching required in conventional processes. The nano/micro hybrid structure arrays we fabricated show a low reflectance of <1% in the 600-1000 nm wavelength range and absorb 98.82% of incident light in the visible and near-infrared regions from 400 to 1100 nm under AM 1.5 G illumination. Solar cells made from nano/micro hybrid 3D structure arrays have an efficiency improvement of about 11.4% compared to those made from mono-micropillar arrays, and they have potential applications in high-performance photovoltaic devices.
三维（3D）硅（Si）纳米结构因其优异的宽带和全向光捕获特性而在太阳能电池领域备受关注。然而，3D硅纳米结构的发展仍受到结构复杂性和制造难度之间权衡的困扰。在此，我们提出了一种简便且稳定的方法来制造具有纳米/微米混合结构的晶圆级超黑晶体硅（c-Si）。该方法的显著优势在于它能够在单轮工艺中形成3D硅纳米/微米混合结构，避免了传统工艺中光刻、涂层和蚀刻的多次重复。我们制造的纳米/微米混合结构阵列在600 - 1000 nm波长范围内显示出<1%的低反射率，并且在AM 1.5 G光照下，在400至1100 nm的可见光和近红外区域吸收98.82%的入射光。由纳米/微米混合3D结构阵列制成的太阳能电池与由单微柱阵列制成的太阳能电池相比，效率提高了约11.4%，并且它们在高性能光伏器件中具有潜在应用。
