Department of Materials Chemistry and Institute of Materials and Systems for Sustainability (IMaSS), Nagoya University, Nagoya, 464-8601, Japan.
International Center for Materials Nanoarchitectonics (WPI-MANA), National Institute for Materials Science (NIMS), Tsukuba, 305-0044, Japan.
Sci Rep. 2023 Feb 14;13(1):2583. doi: 10.1038/s41598-023-29281-w.
Desired electrode patterning on two-dimensional (2D) materials is a foremost step for realizing the full potentials of 2D materials in electronic devices. Here, we introduce an approach for damage-free, on-demand manufacturing of 2D material devices using light-emitting diode (LED) lithography. The advantage of this method lies in mild photolithography by simply combining an ordinary optical microscope with a commercially available LED projector; the low-energy red component is utilized for optical characterization and alignment of devices, whereas the high-energy blue component is utilized for photoresist exposure and development of personal computer designed electrode patterns. This method offers maskless, damage-free photolithography, which is particularly suitable for 2D materials that are sensitive to conventional lithography. We applied this LED lithography to device fabrication of selected nanosheets (MoS, graphene oxides and RuO), and achieved damage-free lithography of various patterned electrodes with feature sizes as small as 1-2 μm. The LED lithography offers a useful approach for cost-effective mild lithography without any costly instruments, high vacuum, or complex operation.
在二维 (2D) 材料上实现所需的电极图案是实现 2D 材料在电子设备中全部潜力的首要步骤。在这里，我们介绍了一种使用发光二极管 (LED) 光刻技术实现 2D 材料器件无损、按需制造的方法。该方法的优点在于通过简单地将普通光学显微镜与市售的 LED 投影仪相结合，实现温和的光刻；低能量的红色组件用于光学特性和器件对准，而高能量的蓝色组件用于光刻胶曝光和个人电脑设计的电极图案显影。这种方法提供了无掩模、无损光刻，特别适用于对传统光刻敏感的 2D 材料。我们将这种 LED 光刻技术应用于选定纳米片（MoS、石墨烯氧化物和 RuO）的器件制造中，并实现了各种图案化电极的无损光刻，其特征尺寸小至 1-2μm。LED 光刻技术提供了一种具有成本效益的温和光刻的有用方法，无需任何昂贵的仪器、高真空或复杂的操作。
