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具有高迁移率的单层 4 英寸长度过渡金属二卤化物单晶的桥接合成和可控掺杂。

Bridging Synthesis and Controllable Doping of Monolayer 4 in. Length Transition-Metal Dichalcogenides Single Crystals with High Electron Mobility.

机构信息

The Institute for Advanced Studies, Wuhan University, Wuhan, 430072, P. R. China.

Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Xiangtan, 411105, P. R. China.

出版信息

Adv Mater. 2023 Jun;35(23):e2211536. doi: 10.1002/adma.202211536. Epub 2023 Apr 27.

Abstract

Epitaxial growth and controllable doping of wafer-scale atomically thin semiconductor single crystals are two central tasks to tackle the scaling challenge of transistors. Despite considerable efforts are devoted, addressing such crucial issues simultaneously under 2D confinement is yet to be realized. Here, an ingenious strategy to synthesize record-breaking 4 in. length Fe-doped transition-metal dichalcogenides (TMDCs) single crystals on industry-compatible c-plane sapphire without special miscut angle is designed. Atomically thin transistors with high electron mobility (≈146 cm V s ) and remarkable on/off current ratio (≈10 ) are fabricated based on 4 in. length Fe-MoS single crystals, due to the ultralow contact resistance (≈489 Ω µm). In-depth characterizations and theoretical calculations reveal that the introduction of Fe significantly decreases the formation energy of parallel steps on sapphire surfaces and contributes to the edge-nucleation of unidirectional alignment TMDCs domains (>99%). This work represents a substantial leap in terms of bridging synthesis and doping of wafer-scale 2D semiconductor single crystals, which should promote the further device downscaling and extension of Moore's law.

摘要

在二维限制下,同时解决这两个关键问题仍有待实现。在这里,设计了一种巧妙的策略,在工业兼容的 c 面蓝宝石上合成创纪录的 4 英寸长的掺铁过渡金属二卤化物(TMDC)单晶,而无需特殊的偏角。基于 4 英寸长的 Fe-MoS 单晶,制造出具有高电子迁移率(≈146cmVs)和显著的开/关电流比(≈10)的原子薄晶体管,这归因于超低的接触电阻(≈489Ωµm)。深入的特性分析和理论计算表明,Fe 的引入显著降低了蓝宝石表面平行台阶的形成能,并有助于单向排列 TMDC 畴的边缘成核(>99%)。这项工作在晶圆级二维半导体单晶的合成和掺杂方面取得了重大进展,这应该会促进进一步的器件小型化和摩尔定律的扩展。

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