Pavoni Eleonora, Mohebbi Elaheh, Stipa Pierluigi, Pierantoni Luca, Mencarelli Davide, Dragoman Mircea, Aldrigo Martino, Laudadio Emiliano
Marche Polytechnic University Via Brecce Bianche 60131 Ancona Italy
National Institute for Research and Development in Microtechnologies, IMT-Bucharest 077190 Voluntari (Ilfov) Romania
Nanoscale Adv. 2023 Mar 24;5(10):2748-2755. doi: 10.1039/d2na00739h. eCollection 2023 May 16.
Metal-insulator-metal (MIM) diodes are very interesting in many different applications exploiting environment-friendly renewable energy solutions. Moreover, since the dimensions of such devices are at the nanoscale, the size and the characteristics of their constitutive elements can drastically influence their macroscale performance. As it could be difficult to describe in detail the physical phenomena occurring among materials in nanoscale systems, in this work first-principles calculations have been used to study the structural and electrical properties of three different hafnium oxide (HfO)-MIM diodes. These devices have been simulated at the atomistic level by interposing 3 nm of HfO between drain and source electrodes made of gold and platinum, respectively. The monoclinic and orthorhombic polymorphs of HfO have been considered to model different types of MIM diodes, and the interface geometries have been optimized to compute the current-voltage characteristics, reflecting the tunneling mechanisms occurring in such devices. The calculation of the transmission pathways has also been carried out to investigate the effects of atomistic coordinates despite the use of the same material. The results demonstrate the role of the Miller indices of metals and the influence of the HfO polymorphs on the MIM properties. In this study, the importance of interface phenomena on the measurable properties of the proposed devices has been investigated in detail.
金属-绝缘体-金属(MIM)二极管在许多利用环保可再生能源解决方案的不同应用中非常有趣。此外,由于此类器件的尺寸处于纳米尺度,其组成元件的尺寸和特性会极大地影响其宏观性能。由于难以详细描述纳米尺度系统中材料之间发生的物理现象,在这项工作中,采用第一性原理计算来研究三种不同的氧化铪(HfO)-MIM二极管的结构和电学性质。这些器件通过在分别由金和铂制成的漏极和源极电极之间插入3 nm的HfO在原子水平上进行了模拟。HfO的单斜晶型和正交晶型多晶型物被用来模拟不同类型的MIM二极管,并且对界面几何结构进行了优化以计算电流-电压特性,反映此类器件中发生的隧穿机制。尽管使用相同的材料,还进行了传输路径的计算以研究原子坐标的影响。结果证明了金属的米勒指数的作用以及HfO多晶型物对MIM性质的影响。在这项研究中,已详细研究了界面现象对所提出器件可测量性质的重要性。